SCHEMBL13476262

SCHEMBL13476262

C1=CCCC(Sc2ccccc2)=C1

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.33
MAPT P10636 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
MGLL Q99685 1/20 0.33
HSD17B10 Q99714 1/20 0.33
HTR6 P50406 1/20 0.33
TUBB4A P04350 1/20 0.32
TUBB P07437 1/20 0.32
TUBA3C P0DPH7 1/20 0.32
TUBA1B P68363 1/20 0.32
TUBA4A P68366 1/20 0.32
TUBB4B P68371 1/20 0.32
TUBB3 Q13509 1/20 0.32
TUBB2A Q13885 1/20 0.32
TUBB8 Q3ZCM7 1/20 0.32
TUBA3E Q6PEY2 1/20 0.32
TUBA1A Q71U36 1/20 0.32
TUBA1C Q9BQE3 1/20 0.32
TUBB6 Q9BUF5 1/20 0.32
TUBB2B Q9BVA1 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8256204 0.82 HPGD (0.48) HPGDMAPTSMN1; SMN2MGLLHSD17B10
SCHEMBL12660314 0.80 TDP1 (0.34) MAPTSMN1; SMN2NPC1RAB9A
SCHEMBL14414959 0.75
SCHEMBL23939321 0.73 ALDH1A1 (0.33) HPGDMAPTSMN1; SMN2MGLLHSD17B10
SCHEMBL10639890 0.70 NR1H2 (0.41)
SCHEMBL10639881 0.70 NR1H2 (0.41)
SCHEMBL12660754 0.69 ALDH1A1 (0.34) HPGDMAPTSMN1; SMN2MGLLHSD17B10
SCHEMBL10222484 0.69
SCHEMBL23229304 0.69 MMP13 (0.33) HPGDMAOAMAOBALDH1A1
SCHEMBL787585 0.67 ALDH1A1 (0.36) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3560968-A1 COMPOSITION, CURED PRODUCT AND LAMINATE DIC Corporation (JP) 2019-10-30 EP disclosed
EP-3486272-A1 AROMATIC POLYTHIOL COMPOUND FOR OPTICAL MATERIAL SKC Co., Ltd. (KR) 2019-05-22 EP disclosed
US-9851636-B2 Materials and methods for improved photoresist performance TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2017-12-26 US disclosed
WO-2014119698-A1 PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-07 WO disclosed
EP-1767353-A2 Lithographic printing plate precursor, lithographic printing method and cyanine dye FUJIFILM Corporation (JP) 2007-03-28 EP disclosed