SCHEMBL1348293

SCHEMBL1348293

CC(C)(C)OOc1c(C(=O)O)cccc1[N+](=O)[O-]

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.55
TDP1 Q9NUW8 2/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
ALDH1A1 P00352 4/20 0.43
HTT P42858 1/20 0.43
KDM4E B2RXH2 2/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
GAA P10253 1/20 0.41
MAPT P10636 1/20 0.41
NPSR1 Q6W5P4 1/20 0.40
DNA2 P51530 1/20 0.40
CASP6 P55212 1/20 0.40
CTDSP1 Q9GZU7 1/20 0.40
AKR1C3 P42330 2/20 0.39
AKR1C2 P52895 2/20 0.39
AKR1B10 O60218 1/20 0.39
AKR1B1 P15121 1/20 0.39
AKR1C4 P17516 1/20 0.39
AKR1C1 Q04828 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2000365 0.83 ALDH1A1 (0.47) TSHRTDP1ALDH1A1HTTKDM4E
SCHEMBL521662 0.80 TSHR (0.68) TSHRTDP1L3MBTL1ALDH1A1KDM4E
SCHEMBL1348294 0.78 TSHR (0.45) TSHRTDP1L3MBTL1ALDH1A1HTT
SCHEMBL1348296 0.78 TSHR (0.45) TSHRTDP1L3MBTL1ALDH1A1HTT
SCHEMBL27664107 0.78 KDM4E (0.59) TSHRTDP1L3MBTL1ALDH1A1KDM4E
SCHEMBL346597 0.77 MAPK1 (0.50) TSHRTDP1ALDH1A1HTTKDM4E
SCHEMBL15623 0.77 TSHR (0.58) TSHRTDP1L3MBTL1ALDH1A1KDM4E
SCHEMBL14973533 0.77 TSHR (0.58) TSHRTDP1L3MBTL1ALDH1A1KDM4E
SCHEMBL1606328 0.77 ALDH1A1 (0.58) TSHRTDP1L3MBTL1ALDH1A1HTT
SCHEMBL14329478 0.77 TSHR (0.58) TSHRTDP1L3MBTL1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8063245-B2 Phosphazene compound, photosensitive resin composition and use thereof KANEKA CORPORATION (JP) 2011-11-22 US disclosed
US-20100218984-A1 PHOTOSENSITIVE DRY FILM RESIST, PRINTED WIRING BOARD MAKING USE OF THE SAME, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD KANEKA CORPORATION (JP) 2010-09-02 US disclosed
US-7396898-B2 Diamine, acid dianhydride, and reactive group containing polyimide composition prepared therefrom and process of preparing them KANEKA CORPORATION (JP) 2008-07-08 US disclosed
US-7141614-B2 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2006-11-28 US disclosed
US-20060199920-A1 Photosensitive resin composition capable of being developed with aqueous developer and photosensitive dry film resist, and use thereof KANEKA CORPORATION (JP) 2006-09-07 US disclosed
US-20060142542-A1 Phosphazene compound, photosensitive resin composition and use thereof KANEKA CORPORATION (JP) 2006-06-29 US disclosed
US-20040158030-A1 Diamine, acid dianhydride, polymide composition having reactive group obtained therefrom, and processes for producing these KANEKA CORPORATION (JP) 2004-08-12 US disclosed
US-20040048978-A1 Photosensitive resin composition, solder resist comprising the same, cover lay film, and printed circuit board KANEKA CORPORATION (JP) 2004-03-11 US disclosed
US-6605353-B2 Polyimide derived from a dianhydride and diamine having hydroxyl or carboxyl groups, which are modified with a diepoxide or unsaturated group-containing epoxide; curable; heat resistance, dielectric, film-forming KANEKA CORPORATION (JP) 2003-08-12 US disclosed
US-20010056174-A1 Epoxy-modified polyimide, photosensitive composition, coverlay film, solder resist, and printed wiring board using the epoxy-modified polyimide KANEKA CORPORATION (JP) 2001-12-27 US disclosed