SCHEMBL1348356

SCHEMBL1348356

CC(O[N+](=O)[O-])c1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GSR P00390 1/20 0.55
PTGS1 P23219 3/20 0.43
PTGS2 P35354 3/20 0.43
HCAR2 Q8TDS4 1/20 0.41
NPC1 O15118 2/20 0.40
ADAM17 P78536 1/20 0.40
KMT2A Q03164 2/20 0.38
KDM4E B2RXH2 2/20 0.38
MAPT P10636 2/20 0.38
NPSR1 Q6W5P4 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
ALDH1A1 P00352 3/20 0.38
LMNA P02545 1/20 0.38
CRHBP P24387 1/20 0.37
CRHR2 Q13324 1/20 0.37
MEN1 O00255 1/20 0.36
POLB P06746 1/20 0.36
F2 P00734 1/20 0.36
MAPK1 P28482 1/20 0.36
APOBEC3G Q9HC16 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphine SCHEMBL28215785 0.98 GSR (0.53) GSRPTGS1PTGS2HCAR2NPC1
SCHEMBL8957398 0.80 GSR (0.51) GSRPTGS1PTGS2NPC1ADAM17
SCHEMBL9838307 0.78 GSR (0.58) GSRPTGS1PTGS2NPC1ADAM17
SCHEMBL28047729 0.76 GSR (0.71) GSRPTGS1PTGS2NPC1ADAM17
SCHEMBL26614000 0.75 GSR (0.59) GSRPTGS1PTGS2NPC1ADAM17
SCHEMBL10403262 0.75 GSR (0.55) GSRPTGS1PTGS2NPC1ADAM17
SCHEMBL27319378 0.75 GSR (0.69) GSRPTGS1PTGS2NPC1ADAM17
Isopropylbenzene SCHEMBL30821949 0.71 ALDH1A1 (0.42) GSRNPC1ADAM17KMT2AKDM4E
SCHEMBL264411 0.71 KDM4E (0.45) GSRPTGS2NPC1ADAM17KMT2A
SCHEMBL20680909 0.71 KDM4E (0.45) GSRPTGS2NPC1ADAM17KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119931727-A Fuel composition and application thereof 中国石油化工股份有限公司 2025-05-06 CN claimed
CN-112240239-A Compression ignition internal combustion engine using reactive agent 周氏(北京)汽车技术有限公司 2021-01-19 CN claimed
CN-111952665-A Electrolyte solution for lithium iron phosphate-based lithium secondary battery and secondary battery comprising same 现代自动车株式会社 2020-11-17 CN claimed
CN-119931727-A Fuel composition and application thereof 中国石油化工股份有限公司 2025-05-06 CN disclosed
WO-2025007135-A9 CONTROLLED GLYCAN METABOLIC ENGINEERING SYSTEMS AND APPLICATIONS THEREOF WAYNE STATE UNIVERSITY (US) 2025-03-27 WO disclosed
WO-2025007135-A2 CONTROLLED GLYCAN METABOLIC ENGINEERING SYSTEMS AND APPLICATIONS THEREOF WAYNE STATE UNIVERSITY (US) 2025-01-02 WO disclosed
CN-117514555-A Fuel injection device, method of controlling the same, apparatus for controlling the same, and readable storage medium 浙江吉利控股集团有限公司 2024-02-06 CN disclosed
CN-112240239-A Compression ignition internal combustion engine using reactive agent 周氏(北京)汽车技术有限公司 2021-01-19 CN disclosed
CN-111952665-A Electrolyte solution for lithium iron phosphate-based lithium secondary battery and secondary battery comprising same 现代自动车株式会社 2020-11-17 CN disclosed
CN-109516945-A A kind of preparation method of 5- methoxy-Indole 嘉兴市秀洲区洪合镇中学 2019-03-26 CN disclosed
CN-105712941-A Preparation method of quinazolinone compound 哈尔滨工业大学(威海) 2016-06-29 CN disclosed
CN-103232511-B Light-cleavable group protected deoxyuridine triphosphate derivatives and a synthesis method and applications thereof. UNIV BEIJING 2015-06-17 CN disclosed
US-8063245-B2 Phosphazene compound, photosensitive resin composition and use thereof KANEKA CORPORATION (JP) 2011-11-22 US disclosed
US-20100218984-A1 PHOTOSENSITIVE DRY FILM RESIST, PRINTED WIRING BOARD MAKING USE OF THE SAME, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD KANEKA CORPORATION (JP) 2010-09-02 US disclosed
CN-101433561-A Remedies TAKARA BIO INC (JP) 2009-05-20 CN disclosed
US-7141614-B2 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2006-11-28 US disclosed
US-20060199920-A1 Photosensitive resin composition capable of being developed with aqueous developer and photosensitive dry film resist, and use thereof KANEKA CORPORATION (JP) 2006-09-07 US disclosed
US-20060142542-A1 Phosphazene compound, photosensitive resin composition and use thereof KANEKA CORPORATION (JP) 2006-06-29 US disclosed
US-20040265731-A1 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2004-12-30 US disclosed
US-5258049-A Nitric acid esters of phenylethanol ARCO CHEMICAL TECHNOLOGY, L.P. (US) 1993-11-02 US disclosed