Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.53 |
| ▸ | IDO1 | P14902 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 2/20 | 0.36 |
| ▸ | RAB9A | P51151 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | GCGR | P47871 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10623477 | 0.80 | LMNA (0.53) | LMNACYP2A6IDO1TSHRCYP1A2 | |
| SCHEMBL8372965 | 0.80 | LMNA (0.53) | LMNACYP2A6IDO1TSHRCYP1A2 | |
| SCHEMBL28562990 | 0.76 | LMNA (0.57) | LMNACYP2A6IDO1TSHRCYP1A2 | |
| SCHEMBL20455818 | 0.75 | LMNA (0.47) | LMNACYP2A6IDO1TSHRCYP1A2 | |
| SCHEMBL7913246 | 0.75 | LMNA (0.47) | LMNACYP2A6IDO1TSHRCYP1A2 | |
| SCHEMBL6477550 | 0.75 | LMNA (0.47) | LMNACYP2A6IDO1TSHRCYP1A2 | |
| SCHEMBL12816216 | 0.73 | CYP1A2 (0.50) | LMNACYP2A6CYP1A2NPC1RAB9A | |
| 1,4-Dichlorobenzene SCHEMBL5191 | 0.73 | — | — | |
| 1,4-Dichlorobenzene SCHEMBL11243685 | 0.73 | — | — | |
| SCHEMBL136168 | 0.71 | TYR (0.41) | LMNAIDO1NPC1RAB9AHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 286 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9356156-B2 | Stable high mobility MOTFT and fabrication at low temperature | CBRITE INC. (US) | 2016-05-31 | — | — | US | claimed |
| EP-3005420-A2 | STABLE HIGH MOBILITY MOTFT AND FABRICATION AT LOW TEMPERATURE | CBrite Inc. (US) | 2016-04-13 | — | — | EP | claimed |
| CN-105308753-A | Stable high mobility motft and fabrication at low temperature | CBRITE INC | 2016-02-03 | — | — | CN | claimed |
| US-20140346495-A1 | STABLE HIGH MOBILITY MOTFT AND FABRICATION AT LOW TEMPERATURE | FULL STRENGTH GROUP LIMITED (HK) | 2014-11-27 | — | — | US | claimed |
| CN-101792147-B | Surface modification method of silica particles and method for displaying latent fingerprints | UNIV TSINGHUA GRADUATE SCHOOL | 2012-05-09 | — | — | CN | claimed |
| CN-101792147-A | Surface modification method of silica particles and method for displaying latent fingerprints | UNIV TSINGHUA GRADUATE SCHOOL | 2010-08-04 | — | — | CN | claimed |
| US-20080146011-A1 | METHOD OF FORMING SELF-ASSEMBLED MONOLAYER ON ITO FILM | KONKUK UNIVERSITY INDUSTRIAL COOPERATION CORP. (KR) | 2008-06-19 | — | — | US | claimed |
| US-4033991-A | REACTING HALOGENOSILANE WITH A METAL OXIME | SHIN-ETSU CHEMICAL COMPANY, LIMITED (JA) | 1977-07-05 | — | — | US | claimed |
| EP-4481500-A1 | TONER, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND METHOD OF MANUFACTURING PRINTED MATTER | Ricoh Company, Ltd. (JP) | 2024-12-25 | — | — | EP | disclosed |
| US-20240377770-A1 | TONER, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND METHOD OF MANUFACTURING PRINTED MATTER | RICOH COMPANY, LTD. (JP) | 2024-11-14 | — | — | US | disclosed |
| US-20230416467-A1 | FUNCTIONALIZED Q-T-SILOXANE-BASED POLYMERIC MATERIALS WITH LOW SILOXANE RING CONTENT, SPECIFIC DEGREE OF POLYMERIZATION, AND METHOD FOR PREPARING SAME | SILOXENE AG (CH) | 2023-12-28 | — | — | US | disclosed |
| CN-114402036-B | Curable composition, cured product, and method for using curable composition | 琳得科株式会社 | 2023-11-21 | — | — | CN | disclosed |
| EP-4214268-A1 | FUNCTIONALIZED Q-T-SILOXANE-BASED POLYMERIC MATERIALS WITH LOW SILOXANE RING CONTENT, SPECIFIC DEGREE OF POLYMERIZATION, AND METHOD FOR PREPARING SAME | Siloxene AG (CH) | 2023-07-26 | — | — | EP | disclosed |
| US-20230205105-A1 | TONER, IMAGE FORMING APPARATUS, IMAGE FORMATION METHOD, AND PRINTED MATTER MANUFACTURING METHOD | RICOH COMPANY, LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| WO-1987004810-A1 | METHOD FOR DEVELOPING POLY(METHACRYLIC ANHYDRIDE) RESISTS | HUGHES AIRCRAFT COMPANY (US) | 1987-08-13 | — | — | WO | disclosed |
| EP-0215069-A1 | POLYSILOXANE RESIST FOR ION BEAM AND ELECTRON BEAM LITHOGRAPHY. | HUGHES AIRCRAFT CO (US) | 1987-03-25 | — | — | EP | disclosed |
| WO-1986005284-A1 | POLYSILOXANE RESIST FOR ION BEAM AND ELECTRON BEAM LITHOGRAPHY | HUGHES AIRCRAFT COMPANY (US) | 1986-09-12 | — | — | WO | disclosed |
| US-4585723-A | SILICON DIOXIDE PARTICLES MADE HYDROPHOBIC | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1986-04-29 | — | — | US | disclosed |
| US-4033991-A | REACTING HALOGENOSILANE WITH A METAL OXIME | SHIN-ETSU CHEMICAL COMPANY, LIMITED (JA) | 1977-07-05 | — | — | US | disclosed |
| US-3987009-A | TRANSITION METAL CATALYST COMPOSITIONS | UNION CARBIDE CORPORATION (US) | 1976-10-19 | — | — | US | disclosed |