Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.67 |
| ▸ | MAPK14 | Q16539 | 2/20 | 0.55 |
| ▸ | PPARG | P37231 | 2/20 | 0.46 |
| ▸ | PPARA | Q07869 | 1/20 | 0.46 |
| ▸ | MAPKAPK2 | P49137 | 3/20 | 0.46 |
| ▸ | DRD2 | P14416 | 1/20 | 0.46 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.46 |
| ▸ | MAP4K4 | O95819 | 1/20 | 0.46 |
| ▸ | SAE1 | Q9UBE0 | 1/20 | 0.45 |
| ▸ | UBA2 | Q9UBT2 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | BLM | P54132 | 1/20 | 0.44 |
| ▸ | CASP6 | P55212 | 1/20 | 0.44 |
| ▸ | GFER | P55789 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL132701 | 0.92 | CYP17A1 (0.76) | CYP17A1MAPK14PPARGPPARADRD2 | |
| SCHEMBL78108 | 0.91 | MAPT (0.53) | CYP17A1MAPKAPK2MAP4K4MAPTRAB9A | |
| Hydrochloric Acid SCHEMBL28891842 | 0.89 | MAPT (0.52) | CYP17A1MAPKAPK2MAP4K4MAPTRAB9A | |
| SCHEMBL1849865 | 0.87 | CYP17A1 (0.52) | CYP17A1MAPK14PPARGPPARASAE1 | |
| SCHEMBL14379115 | 0.86 | CYP17A1 (0.68) | CYP17A1MAPK14PPARGPPARADRD2 | |
| SCHEMBL10249437 | 0.86 | CYP17A1 (0.68) | CYP17A1MAPK14PPARGPPARADRD2 | |
| SCHEMBL26643063 | 0.86 | PRMT1 (0.49) | CYP17A1MAPKAPK2MAP4K4MAPTRAB9A | |
| SCHEMBL3785153 | 0.86 | CYP17A1 (0.59) | CYP17A1MAPKAPK2MAP4K4MAPTRAB9A | |
| SCHEMBL13654831 | 0.85 | CYP17A1 (0.50) | CYP17A1MAPK14PPARGPPARAMAPKAPK2 | |
| Methane SCHEMBL28036476 | 0.84 | CYP17A1 (0.58) | CYP17A1MAPKAPK2MAP4K4MAPTRAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 364 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| US-20210200097-A1 | TREATMENT LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2021-07-01 | — | — | US | disclosed |
| US-11042094-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2021-06-22 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| US-10962884-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2021-03-30 | — | — | US | disclosed |
| EP-2414896-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2020-11-11 | — | — | EP | disclosed |
| US-20200166843-A1 | PATTERN FORMING METHOD AND PROCESSING LIQUID | JSR CORPORATION (JP) | 2020-05-28 | — | — | US | disclosed |
| US-20200124961-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-5334729-A | Derivatives of 1,2-diaminocyclohexanetetraacetic acid | ASSOCIATED UNIVERSITIES, INC. (US) | 1994-08-02 | — | — | US | disclosed |
| US-5089663-A | Chelating agents for labeling antibodies, antitumor agents | ASSOCIATED UNIVERSITIES, INC. (US) | 1992-02-18 | — | — | US | disclosed |
| US-5021571-A | Rigid compound used in chelating stable radiometal labeled antibodies | ASSOCIATED UNIVERSITIES, INC. (US) | 1991-06-04 | — | — | US | disclosed |