SCHEMBL1353707

SCHEMBL1353707

CCCC(O)CC=C(C)C(=O)O

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM1 P11229 1/20 0.37
AKR1A1 P14550 1/20 0.37
CHRM3 P20309 1/20 0.37
HTR2A P28223 1/20 0.37
HTR2C P28335 1/20 0.37
ADRA1A P35348 1/20 0.37
HRH1 P35367 1/20 0.37
DRD3 P35462 1/20 0.37
SLC6A3 Q01959 1/20 0.37
HDAC1 Q13547 1/20 0.37
HDAC2 Q92769 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
FFAR1 O14842 3/20 0.35
FFAR4 Q5NUL3 2/20 0.35
GPR84 Q9NQS5 7/20 0.33
NFKB1 P19838 3/20 0.33
NFKB2 Q00653 1/20 0.33
RELA Q04206 1/20 0.33
CD81 P60033 1/20 0.32
CYP3A4 P08684 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10909635 1.00 CHRM1 (0.37) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL12076392 0.89 GPR84 (0.43) FFAR1FFAR4GPR84NFKB1NFKB2
SCHEMBL613229 0.89 GPR84 (0.43) FFAR1FFAR4GPR84NFKB1NFKB2
SCHEMBL4051342 0.86 CHRM1 (0.33) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL1627407 0.85 GPR84 (0.53) FFAR1FFAR4GPR84NFKB1FAAH
SCHEMBL1627410 0.85 GPR84 (0.53) FFAR1FFAR4GPR84NFKB1FAAH
SCHEMBL14245019 0.85 GPR84 (0.53) FFAR1FFAR4GPR84NFKB1FAAH
SCHEMBL26980104 0.85 GPR84 (0.53) FFAR1FFAR4GPR84NFKB1FAAH
SCHEMBL6063799 0.85 GPR84 (0.53) FFAR1FFAR4GPR84NFKB1FAAH
SCHEMBL9339953 0.85 CD81 (0.36) CD81GRIK1GRIK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3127927-B1 HEAT RESISTANT SAN RESIN, PREPARATION METHOD THEREFOR, AND HEAT RESISTANT SAN RESIN COMPOSITION CONTAINING SAME LG CHEMICAL LTD (KR) 2020-06-24 EP claimed
EP-2957576-B1 SUPERABSORBENT RESIN PREPARATION METHOD LG CHEMICAL LTD (KR) 2018-07-25 EP claimed
EP-2084219-B1 POLYMERIC COUPLING AGENTS LUBRIZOL LTD (GB) 2012-09-05 EP claimed
US-20240010847-A1 COATING FILM FORMING COMPOSITION AND COATING FILM NITTO DENKO CORPORATION (JP) 2024-01-11 US disclosed
EP-4130170-A1 COMPOSITION FOR COATING-FILM FORMATION, AND COATING FILM NITTO DENKO CORPORATION (JP) 2023-02-08 EP disclosed
WO-2020130072-A1 COATING AGENT, COATING FILM, AND LAMINATE DIC株式会社 2020-06-25 WO disclosed
US-10093828-B2 Processing fluid for image forming by aqueous ink, image forming method, recorded matter, and inkjet recording device RICOH COMPANY, LTD. (JP) 2018-10-09 US disclosed
US-9955874-B2 Phantom CANON KABUSHIKI KAISHA (JP) 2018-05-01 US disclosed
US-9815922-B2 Method for producing end-modified polybutadiene or end-modified hydrogenated polybutadiene and composition containing same NIPPON SODA CO., LTD. (JP) 2017-11-14 US disclosed
US-20160312061-A1 PROCESSING FLUID FOR IMAGE FORMING BY AQUEOUS INK, IMAGE FORMING METHOD, RECORDED MATTER, AND INKJET RECORDING DEVICE RICOH COMPANY, LTD. (JP) 2016-10-27 US disclosed
US-9428605-B2 Organic-inorganic hybrid material compositions and polymer composites NEO SITECH LLC (US) 2016-08-30 US disclosed
US-20060063857-A1 Ink composition for inkjet recording and inkjet recording method FUJI PHOTO FILM CO., LTD. 2006-03-23 US disclosed
EP-1628954-A2 ACYLSULFAMIDE INHIBITORS OF FACTOR VIIA Genentech, Inc. (US) 2006-03-01 EP disclosed
WO-2004113278-A2 ACYLSULFAMIDE INHIBITORS OF FACTOR VIIA GENENTECH, INC. (US) 2004-12-29 WO disclosed
US-5677385-A ACRYLIC OR METHACRYLIC POLYMER COMPRISING A MODIFIED ALICYCLIC EPOXY GROUP; PHOTOSENSITIVITY, HYDROLYSIS RESISTANCE, TACKINESS, STABILITY, DEVELOPABILITY DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1997-10-14 US disclosed
US-5650233-A Photo-setting colored filter composition, a color filter, a process for the preparation thereof, and a curable resin composition DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1997-07-22 US disclosed
EP-0736555-A2 Radiation-curable epoxy resin composition U C B, S.A. (BE) 1996-10-09 EP disclosed
EP-0726279-A2 A photo-setting colored filter compositions, a color filter, a process for the preparation thereof, and a curable resin composition DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1996-08-14 EP disclosed
US-5534322-A OPTICAL AND MAGNETIC DISKS WITH ANTISTATIC OVERCOATING, QUATERNIZED ADDITION POLYMER KAO CORPORATION (JP) 1996-07-09 US disclosed
US-4587201-A Photo-curable urethane-acrylate resin composition for permanent resist NIPPON SODA CO. LTD. (JP) 1986-05-06 US disclosed