Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGKA | P23743 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10191365 | 0.94 | — | — | |
| SCHEMBL14817690 | 0.92 | DGKA (0.30) | DGKAMEN1KMT2A | |
| SCHEMBL2611421 | 0.88 | MEN1 (0.32) | MEN1KMT2A | |
| SCHEMBL12235013 | 0.86 | — | — | |
| SCHEMBL10191367 | 0.85 | FGFR1 (0.33) | — | |
| SCHEMBL13558168 | 0.84 | — | — | |
| SCHEMBL2611419 | 0.83 | — | — | |
| SCHEMBL19407219 | 0.82 | DGKA (0.34) | DGKA | |
| SCHEMBL16572698 | 0.81 | — | — | |
| SCHEMBL10192987 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8846838-B2 | Fluorine-containing block copolymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8790868-B2 | Method of forming resist pattern and negative tone-development resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8475997-B2 | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-20130053518-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-02-28 | — | — | US | disclosed |
| US-8367296-B2 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-20120276481-A1 | METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESIST COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-11-01 | — | — | US | disclosed |