⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28034282 | 1.00 | — | — | |
| SCHEMBL1926155 | 0.75 | — | — | |
| SCHEMBL12005799 | 0.69 | — | — | |
| SCHEMBL2121122 | 0.62 | — | — | |
| N,N-Dimethylethanaminium SCHEMBL2146567 | 0.61 | TSHR (0.36) | — | |
| N,N-Dimethylethanaminium SCHEMBL16338 | 0.61 | — | — | |
| N,N-Dimethylethanaminium SCHEMBL352062 | 0.61 | — | — | |
| SCHEMBL42413 | 0.61 | — | — | |
| Butane SCHEMBL2058367 | 0.58 | — | — | |
| SCHEMBL1363064 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 878 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4688204-A1 | ATOMIC LAYER DEPOSITION OF FILTRATION MEDIA | Donaldson Company, Inc. (US) | 2026-02-11 | — | — | EP | claimed |
| US-20260007571-A1 | PHARMACEUTICAL CONTAINER WITH PH PROTECTIVE LAYER DEPOSITED BY ATOMIC LAYER DEPOSITION | INNOVATIVE SCIENTIFIC PRODUCTS, INC. (US) | 2026-01-08 | — | — | US | claimed |
| US-12447107-B2 | Pharmaceutical container with pH protective layer deposited by atomic layer deposition | INNOVATIVE SCIENTIFIC PRODUCTS, INC. (US) | 2025-10-21 | — | — | US | claimed |
| US-12303461-B1 | Pharmaceutical container with pH protective layer deposited by atomic layer deposition | INNOVATIVE SCIENTIFIC PRODUCTS, INC. (US) | 2025-05-20 | — | — | US | claimed |
| WO-2025037567-A1 | SUBSTRATE PROCESSING METHOD | 東京エレクトロン株式会社 | 2025-02-20 | — | — | WO | claimed |
| US-12109173-B1 | Pharmaceutical container with pH protective layer deposited by atomic layer deposition | INNOVATIVE SCIENTIFIC PRODUCTS, INC. (US) | 2024-10-08 | — | — | US | claimed |
| US-20240325990-A1 | ATOMIC LAYER DEPOSITION OF FILTRATION MEDIA | DONALDSON COMPANY, INC. | 2024-10-03 | — | — | US | claimed |
| WO-2024206872-A1 | ATOMIC LAYER DEPOSITION OF FILTRATION MEDIA | DONALDSON COMPANY, INC. (US) | 2024-10-03 | — | — | WO | claimed |
| CN-117904602-A | Method for depositing conformal metal or metalloid silicon nitride films | 弗萨姆材料美国有限责任公司 | 2024-04-19 | — | — | CN | claimed |
| US-20240026532-A1 | SUBSTRATE PROCESSING METHOD | ASM IP HOLDING B.V. (NL) | 2024-01-25 | — | — | US | claimed |
| US-6660628-B1 | Method of MOCVD Ti-based barrier metal thin films with tetrakis (methylethylamino) titanium with octane | SHARP LABORATORIES OF AMERICA, INC. | 2003-12-09 | — | — | US | claimed |
| US-20030124262-A1 | Integration of ALD tantalum nitride and alpha-phase tantalum for copper metallization application | APPLIED MATERIALS INC. | 2003-07-03 | — | — | US | claimed |
| WO-2003050323-A1 | CYCLICAL DEPOSITION OF REFRACTORY METAL SILICON NITRIDE | APPLIED MATERIALS, INC. (US) | 2003-06-19 | — | — | WO | claimed |
| US-20030108674-A1 | Cyclical deposition of refractory metal silicon nitride | APPLIED MATERIALS, INC. | 2003-06-12 | — | — | US | claimed |
| WO-2003038892-A2 | ATOMIC-LAYER-DEPOSITED TANTALUM NITRIDE AND ALPHA-PHASE TANTALUM AS BARRIER LAYERS FOR COPPER METALLIZATION | APPLIED MATERIALS, INC. (US) | 2003-05-08 | — | — | WO | claimed |
| US-20030082307-A1 | Integration of ALD tantalum nitride and alpha-phase tantalum for copper metallization application | APPLIED MATERIALS, INC. | 2003-05-01 | — | — | US | claimed |
| US-20030082301-A1 | Enhanced copper growth with ultrathin barrier layer for high performance interconnects | APPLIED MATERIALS, INC. | 2003-05-01 | — | — | US | claimed |
| US-6468604-B1 | Method for manufacturing a titanium nitride thin film | ANELVA CORPORATION (JP) | 2002-10-22 | — | — | US | claimed |
| US-20020015791-A1 | Method and manufacturing device for manufacturing a titanium nitride thin film | TOBE RYOKI (JP) | 2002-02-07 | — | — | US | claimed |
| US-6037013-A | FORMING POROUS METAL NITRIDE LAYER OVER STRUCTURE, EXPOSING POROUS METAL NITRIDE LAYER TO SILICON-CONTAINING AMBIENT TO OBTAIN A SILICON-CONTAINING LAYER AT A SURFACE OF POROUS METAL NITRIDE LAYER, NITRIDING SILICON-CONTAINING LAYER | TEXAS INSTRUMENTS INCORPORATED (US) | 2000-03-14 | — | — | US | claimed |