⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28034282 | 0.75 | — | — | |
| SCHEMBL135622 | 0.75 | — | — | |
| SCHEMBL6564295 | 0.74 | — | — | |
| SCHEMBL1928879 | 0.74 | — | — | |
| SCHEMBL1927788 | 0.74 | — | — | |
| SCHEMBL30851357 | 0.72 | — | — | |
| SCHEMBL438244 | 0.59 | — | — | |
| Bromide SCHEMBL11334148 | 0.57 | — | — | |
| Water SCHEMBL28817745 | 0.57 | — | — | |
| SCHEMBL12005799 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2069369-B1 | HETEROLEPTIC ORGANOMETALLIC COMPOUNDS | PRAXAIR TECHNOLOGY INC (US) | 2016-11-23 | — | — | EP | claimed |
| US-7956207-B2 | such as bis(dimethylamino)bis(bis(trimethylsilyl)amino)hafnium, used as films on substrates such as wafers in the manufacture of semiconductors, dielectrics, barriers and electrodes having heat resistance | PRAXAIR TECHNOLOGY, INC. (US) | 2011-06-07 | — | — | US | claimed |
| EP-2069369-A1 | HETEROLEPTIC ORGANOMETALLIC COMPOUNDS | PRAXAIR TECHNOLOGY, INC. (US) | 2009-06-17 | — | — | EP | claimed |
| WO-2008039960-A1 | HETEROLEPTIC ORGANOMETALLIC COMPOUNDS | PRAXAIR TECHNOLOGY, INC. (US) | 2008-04-03 | — | — | WO | claimed |
| US-20080081922-A1 | Heteroleptic organometallic compounds | PRAXAIR TECHNOLOGY, INC. | 2008-04-03 | — | — | US | claimed |
| EP-2069369-B1 | HETEROLEPTIC ORGANOMETALLIC COMPOUNDS | PRAXAIR TECHNOLOGY INC (US) | 2016-11-23 | — | — | EP | disclosed |
| US-7956207-B2 | such as bis(dimethylamino)bis(bis(trimethylsilyl)amino)hafnium, used as films on substrates such as wafers in the manufacture of semiconductors, dielectrics, barriers and electrodes having heat resistance | PRAXAIR TECHNOLOGY, INC. (US) | 2011-06-07 | — | — | US | disclosed |
| US-20080081922-A1 | Heteroleptic organometallic compounds | PRAXAIR TECHNOLOGY, INC. | 2008-04-03 | — | — | US | disclosed |