SCHEMBL1356987

SCHEMBL1356987

[O]C(Oc1ccccc1)C1CCCCC1

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
METAP2 P50579 3/20 0.45
METAP1 P53582 2/20 0.45
RAB9A P51151 3/20 0.45
ALDH1A1 P00352 1/20 0.45
IDO1 P14902 2/20 0.44
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
MITF O75030 1/20 0.40
CHRNB4 P30926 2/20 0.40
CHRNA3 P32297 2/20 0.40
NPC1 O15118 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
PKM P14618 1/20 0.40
EPHX2 P34913 1/20 0.40
HPGD P15428 1/20 0.40
TSHR P16473 1/20 0.39
EPHX1 P07099 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL61120 0.77 IDO1 (0.44) METAP2METAP1RAB9AALDH1A1IDO1
SCHEMBL1356989 0.77 METAP2 (0.49) METAP2METAP1RAB9AALDH1A1IDO1
SCHEMBL1355000 0.77 SLC6A4 (0.44) ALDH1A1IDO1MEN1KMT2AEPHX2
SCHEMBL10110920 0.74 METAP2 (0.47) METAP2METAP1RAB9AALDH1A1MEN1
SCHEMBL27718594 0.74 IDO1 (0.39) METAP2METAP1RAB9AALDH1A1IDO1
SCHEMBL8605901 0.74 CHRNB4 (0.41) METAP2METAP1RAB9AALDH1A1IDO1
SCHEMBL8403428 0.74 METAP2 (0.47) METAP2METAP1RAB9AALDH1A1MEN1
SCHEMBL9813509 0.74 IDO1 (0.42) METAP2METAP1IDO1MEN1KMT2A
SCHEMBL6778267 0.74 METAP2 (0.40) METAP2METAP1RAB9AALDH1A1IDO1
SCHEMBL6778271 0.74 METAP2 (0.40) METAP2METAP1RAB9AALDH1A1IDO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110281040-A1 LIQUID CRYSTAL DISPLAY ELEMENT, POSITIVE TYPE RADIATION SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND FORMATION METHOD THEREOF JSR CORPORATION (JP) 2011-11-17 US disclosed
US-7749678-B2 contains sulfonium compound; improved line edge roughness and pattern profile, and contrast of sensitivity and dissolution in extreme ultraviolet exposure FUJIFILM CORPORATION (JP) 2010-07-06 US disclosed
US-20050233242-A1 Photosensitive composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2005-10-20 US disclosed
EP-0793144-B1 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 2001-01-17 EP disclosed
US-5962180-A COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT JSR CORPORATION (JP) 1999-10-05 US disclosed
EP-0793144-A2 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-09-03 EP disclosed