Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 1/20 | 0.50 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.50 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.41 |
| ▸ | MMP8 | P22894 | 3/20 | 0.40 |
| ▸ | PPARG | P37231 | 1/20 | 0.40 |
| ▸ | PPARA | Q07869 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | FDPS | P14324 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.39 |
| ▸ | PRMT1 | Q99873 | 1/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | LTA4H | P09960 | 1/20 | 0.38 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1357067 | 0.81 | PPARG (0.50) | SLC6A2TAAR1CYP2D6LMNATRPA1 | |
| SCHEMBL940763 | 0.80 | SLC6A2 (0.46) | SLC6A2TAAR1CYP2D6LMNATRPA1 | |
| SCHEMBL1357703 | 0.79 | SLC6A2 (0.47) | SLC6A2TAAR1CYP2D6LMNATRPA1 | |
| SCHEMBL1356881 | 0.79 | SLC6A2 (0.47) | SLC6A2TAAR1CYP2D6LMNATRPA1 | |
| SCHEMBL1355936 | 0.78 | TRPA1 (0.46) | SLC6A2TAAR1CYP2D6LMNATRPA1 | |
| SCHEMBL1356579 | 0.78 | SLC6A2 (0.45) | SLC6A2TAAR1CYP2D6LMNATRPA1 | |
| SCHEMBL872871 | 0.77 | SLC6A2 (0.54) | SLC6A2TAAR1CYP2D6LMNATRPA1 | |
| SCHEMBL10462120 | 0.77 | SLC6A2 (0.54) | SLC6A2TAAR1CYP2D6LMNATRPA1 | |
| SCHEMBL7666090 | 0.77 | SLC6A2 (0.58) | SLC6A2TAAR1CYP2D6LMNATRPA1 | |
| SCHEMBL8121696 | 0.77 | SLC6A2 (0.58) | SLC6A2TAAR1CYP2D6LMNATRPA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114488688-A | Liquid crystal display element, method for producing same, and radiation-sensitive resin composition | JSR株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-102243386-B | Liquid crystal display cells, positive radiation line sensitive compositions, interlayer dielectric used for liquid crystal display element and forming method thereof | JSR株式会社 | 2016-08-10 | — | — | CN | disclosed |
| CN-102967970-B | The manufacture method of array base palte, liquid crystal display cells and array base palte | JSR CO., LTD. (JP) | 2016-05-25 | — | — | CN | disclosed |
| CN-102870047-B | Positive radiation-sensitive composition, display element interlayer dielectric and forming method thereof | JSR CORP. (JP) | 2016-03-02 | — | — | CN | disclosed |
| CN-102870045-B | Positive Radiation-sensitive Composition For Discharge Nozzle Coating Method, Interlayer Insulating Film For Display Element, And Formation Method For Same | JSR CORP | 2014-11-19 | — | — | CN | disclosed |
| CN-102213918-B | Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor | JSR CORP | 2014-07-16 | — | — | CN | disclosed |
| CN-101646718-B | Curable resin composition, protective film, and method for forming protective film | JSR CORP JP | 2013-04-03 | — | — | CN | disclosed |
| CN-102967970-A | Array substrate, liquid display element, and method for manufacturing array subsrtate | JSR CORP | 2013-03-13 | — | — | CN | disclosed |
| CN-102870047-A | Positive radiation-sensitive composition, interlayer insulating film for display element, and formation method for same | JSR CORP | 2013-01-09 | — | — | CN | disclosed |
| CN-102870045-A | Positive Radiation-sensitive Composition For Discharge Nozzle Coating Method, Interlayer Insulating Film For Display Element, And Formation Method For Same | JSR CORP | 2013-01-09 | — | — | CN | disclosed |
| CN-102213918-A | Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor | JSR CORP | 2011-10-12 | — | — | CN | disclosed |
| CN-101186740-B | Hot curing resin composition and color filter protection film | JSR CORP | 2011-05-25 | — | — | CN | disclosed |
| CN-101646718-A | The formation method of curable resin composition, protective membrane and protective membrane | JSR CORP JP | 2010-02-10 | — | — | CN | disclosed |
| CN-100506877-C | Curable resin composition, protective film, and method for forming same | JSR CORP (JP) | 2009-07-01 | — | — | CN | disclosed |
| CN-101186740-A | Hot curing resin composition and color filter protection film | JSR CORP (JP) | 2008-05-28 | — | — | CN | disclosed |
| CN-101153121-A | Radiation-sensitive resin composition for spacer, spacer and method for forming the same | JSR CORP (JP) | 2008-04-02 | — | — | CN | disclosed |
| CN-101025567-A | Radiation-sensitive resin composition, method for forming spacer and spacer | JSR CORP (JP) | 2007-08-29 | — | — | CN | disclosed |
| CN-1898291-A | Curable resin composition, overcoats, and process for formation thereof | JSR CORP (JP) | 2007-01-17 | — | — | CN | disclosed |
| US-5962180-A | COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT | JSR CORPORATION (JP) | 1999-10-05 | — | — | US | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |