SCHEMBL13588113

SCHEMBL13588113

CSCCC(=O)OCOC1CC(C)CCC1C(C)C

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.46
CYP19A1 P11511 2/20 0.43
MAPT P10636 3/20 0.43
TSHR P16473 2/20 0.43
NPSR1 Q6W5P4 1/20 0.43
P2RX4 Q99571 1/20 0.42
LMNA P02545 2/20 0.42
EPHX1 P07099 2/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
KDM4E B2RXH2 2/20 0.40
APOBEC3A P31941 1/20 0.40
APOBEC3G Q9HC16 1/20 0.40
USP2 O75604 1/20 0.40
GAA P10253 2/20 0.40
HPGD P15428 1/20 0.39
MAPK1 P28482 1/20 0.39
TRPM8 Q7Z2W7 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13588082 0.84 ALDH1A1 (0.48) ALDH1A1CYP19A1MAPTTSHRNPSR1
SCHEMBL2734958 0.78 ALDH1A1 (0.45) ALDH1A1CYP19A1MAPTTSHRNPSR1
SCHEMBL13947774 0.78 ALDH1A1 (0.45) ALDH1A1CYP19A1MAPTTSHRNPSR1
SCHEMBL12567755 0.77 ALDH1A1 (0.47) ALDH1A1CYP19A1MAPTTSHRNPSR1
SCHEMBL10115938 0.77 ALDH1A1 (0.46) ALDH1A1CYP19A1MAPTTSHRNPSR1
SCHEMBL10519642 0.77 ALDH1A1 (0.65) ALDH1A1CYP19A1MAPTNPSR1P2RX4
SCHEMBL20838556 0.75 ALDH1A1 (0.60) ALDH1A1CYP19A1MAPTNPSR1P2RX4
SCHEMBL2214773 0.74 ALDH1A1 (0.58) ALDH1A1CYP19A1MAPTNPSR1P2RX4
SCHEMBL2214774 0.74 ALDH1A1 (0.58) ALDH1A1CYP19A1MAPTNPSR1P2RX4
SCHEMBL869215 0.74 ALDH1A1 (0.61) ALDH1A1CYP19A1MAPTNPSR1P2RX4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7629107-B2 Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition FUJIFILM CORPORATION (JP) 2009-12-08 US disclosed
US-20080085464-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUNDS FOR USE IN THE POSITIVE PHOTOSENSITIVE COMPOSITION, MANUFACTURING METHOD OF THE POLYMER COMPOUNDS, COMPOUNDS FOR USE IN THE MANUFACTURE OF THE POLYMER COMPOUNDS, AND PATTERN-FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2008-04-10 US disclosed