SCHEMBL10115938

SCHEMBL10115938

CCC(C)(C)C(=O)OCOC1CC(C)CCC1C(C)C

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.46
MAPT P10636 2/20 0.45
P2RX4 Q99571 1/20 0.42
LMNA P02545 1/20 0.42
EPHX1 P07099 3/20 0.41
TRPM8 Q7Z2W7 1/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
CYP19A1 P11511 2/20 0.40
KDM4E B2RXH2 1/20 0.40
APOBEC3A P31941 1/20 0.40
APOBEC3G Q9HC16 1/20 0.40
SERPINE1 P05121 1/20 0.40
GAA P10253 1/20 0.40
HPGD P15428 1/20 0.39
NPSR1 Q6W5P4 2/20 0.38
TSHR P16473 1/20 0.38
NFE2L2 Q16236 1/20 0.38
NTSR1 P30989 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13947774 0.90 ALDH1A1 (0.45) ALDH1A1MAPTP2RX4LMNAEPHX1
SCHEMBL2734958 0.90 ALDH1A1 (0.45) ALDH1A1MAPTP2RX4LMNAEPHX1
SCHEMBL130771 0.84 EPHX1 (0.51) ALDH1A1MAPTLMNAEPHX1TRPM8
SCHEMBL16681845 0.81 ALDH1A1 (0.42) ALDH1A1MAPTP2RX4LMNAEPHX1
SCHEMBL13588113 0.77 ALDH1A1 (0.46) ALDH1A1MAPTP2RX4LMNAEPHX1
SCHEMBL10519642 0.77 ALDH1A1 (0.65) ALDH1A1MAPTP2RX4LMNAEPHX1
SCHEMBL13588082 0.76 ALDH1A1 (0.48) ALDH1A1MAPTP2RX4LMNAEPHX1
SCHEMBL869215 0.74 ALDH1A1 (0.61) ALDH1A1MAPTP2RX4LMNAEPHX1
SCHEMBL6139460 0.73 LMNA (0.55) ALDH1A1MAPTP2RX4LMNAEPHX1
SCHEMBL15958908 0.73 ALDH1A1 (0.56) ALDH1A1MAPTP2RX4LMNAEPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9835945-B2 Positive resist composition and method of pattern formation with the same FUJIFILM CORPORATION (JP) 2017-12-05 US disclosed
US-20170123318-A1 POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME FUJIFILM CORPORATION (JP) 2017-05-04 US disclosed
US-9541831-B2 Positive resist composition and method of pattern formation with the same FUJIFILM CORPORATION (JP) 2017-01-10 US disclosed
US-20150185609-A1 POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME FUJIFILM CORPORATION (JP) 2015-07-02 US disclosed
US-9057952-B2 Positive resist composition and method of pattern formation with the same FUJIFILM CORPORATION (JP) 2015-06-16 US disclosed
US-8871421-B2 Positive resist composition and method of pattern formation with the same FUJIFILM CORPORATION (JP) 2014-10-28 US disclosed
US-20120115085-A1 POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME FUJIFILM CORPORATION (JP) 2012-05-10 US disclosed
US-20080305433-A1 POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME FUJIFILM CORPORATION (JP) 2008-12-11 US disclosed
US-20070178405-A1 Positive resist composition and method of pattern formation with the same FUJI PHOTO FILM CO., LTD. 2007-08-02 US disclosed