SCHEMBL13589014

SCHEMBL13589014

CNCN(C)CNC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12901249 0.89 PRMT3 (0.38)
SCHEMBL14578314 0.85 PRMT3 (0.40)
SCHEMBL14578307 0.84 PRMT3 (0.35)
SCHEMBL2733533 0.82
SCHEMBL12901248 0.82 PRMT3 (0.38)
SCHEMBL18892539 0.82
SCHEMBL24764770 0.79
SCHEMBL10330868 0.79
SCHEMBL15919032 0.77
SCHEMBL278606 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2584013-B1 SILICONE RELEASE COATING COMPOSITION OF CONDENSATION REACTION CURING TYPE SHINETSU CHEMICAL CO (JP) 2019-06-05 EP disclosed
US-20170198083-A1 OPTICAL RESIN COMPOSITION AND OPTICAL LENS USING SAME KS LABORATORIES CO., LTD. (KR) 2017-07-13 US disclosed
US-20160032222-A1 CLEANING COMPOSITIONS CONTAINING HIGH FATTY ACIDS THE PROCTER & GAMBLE COMPANY 2016-02-04 US disclosed
EP-2131240-A1 POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION JSR Corporation (JP) 2009-12-09 EP disclosed