SCHEMBL13592689

SCHEMBL13592689

CNC(=O)c1cc(C(c2ccc(C(=O)O)c(C(=O)Nc3ccc(C4(c5ccc(C)cc5)c5ccccc5-c5ccccc54)cc3)c2)(C(F)(F)F)C(F)(F)F)ccc1C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.40
▸ MEN1 O00255 3/20 0.40
▸ POLB P06746 1/20 0.40
▸ SORT1 Q99523 3/20 0.39
▸ NPC1 O15118 2/20 0.37
▸ RAB9A P51151 2/20 0.37
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ MAPT P10636 1/20 0.37
▸ GAA P10253 1/20 0.37
▸ L3MBTL1 Q9Y468 1/20 0.37
▸ PDK2 Q15119 1/20 0.37
▸ ALDH1A1 P00352 2/20 0.37
▸ CYP1A2 P05177 2/20 0.37
▸ HPGD P15428 1/20 0.37
▸ TDP1 Q9NUW8 1/20 0.36
▸ MAPK1 P28482 1/20 0.36
▸ GFER P55789 1/20 0.36
▸ RXFP1 Q9HBX9 1/20 0.36
▸ LMNA P02545 1/20 0.35
▸ TP53 P04637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13592690 0.91 ALDH1A1 (0.38) KMT2AMEN1POLBRAB9AMAPT
SCHEMBL20143297 0.84 SORT1 (0.39) KMT2AMEN1POLBSORT1NPC1
SCHEMBL13345893 0.81 MAPK1 (0.50) KMT2AMEN1POLBSORT1NPC1
SCHEMBL19318220 0.80 ALDH1A1 (0.48) KMT2AMEN1SORT1ALDH1A1CYP1A2
SCHEMBL16926240 0.79 ALDH1A1 (0.47) KMT2AMEN1SORT1ALDH1A1RXFP1
SCHEMBL15479620 0.78 GAA (0.37) SORT1GAAPDK2
SCHEMBL10024745 0.77 SORT1 (0.44) KMT2AMEN1SORT1NPC1RAB9A
SCHEMBL15445491 0.76 NPC1 (0.55) KMT2AMEN1POLBNPC1RAB9A
SCHEMBL14489604 0.76 HTT (0.47) SORT1NPC1RAB9ASMN1; SMN2MAPT
SCHEMBL12259893 0.75 MEN1 (0.41) KMT2AMEN1POLBSORT1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7632622-B2 Antireflective hardmask composition and methods for using same CHEIL INDUSTRIES, INC. (KR) 2009-12-15 — — US disclosed
US-20070003863-A1 Acid catalysts; vapor deposition; etching; photomasks; photoresists; lithography; semiconductors; integrated circuits CHEIL INDUSTRIES, INC. (KR) 2007-01-04 — — US disclosed
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