SCHEMBL13596137

SCHEMBL13596137

CCC(C)(C)C(=O)OC1C2OC(=O)C3C2OC1C3C(=O)OCC(C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13324967 0.93 HMGCR (0.33) HMGCR
SCHEMBL13596138 0.91 FABP7 (0.33) HMGCR
SCHEMBL13324972 0.88 HMGCR (0.32) HMGCR
SCHEMBL47488 0.87 HMGCR (0.34) HMGCR
SCHEMBL12256541 0.86 HMGCR (0.35) HMGCR
SCHEMBL12130476 0.86 HMGCR (0.35) HMGCR
SCHEMBL13294442 0.85 HMGCR (0.35) HMGCR
SCHEMBL14208684 0.84 HMGCR (0.30) HMGCR
SCHEMBL13232094 0.84 HMGCR (0.34) HMGCR
SCHEMBL9973290 0.82 HMGCR (0.31) HMGCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638260-B2 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-29 US disclosed
US-20080124653-A1 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-05-29 US disclosed