Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13596137 | 0.91 | HMGCR (0.33) | HMGCR | |
| SCHEMBL13324967 | 0.91 | HMGCR (0.33) | HMGCR | |
| SCHEMBL13324972 | 0.86 | HMGCR (0.32) | HMGCR | |
| SCHEMBL47488 | 0.85 | HMGCR (0.34) | HMGCR | |
| SCHEMBL12256541 | 0.84 | HMGCR (0.35) | HMGCR | |
| SCHEMBL9973290 | 0.84 | HMGCR (0.31) | HMGCR | |
| SCHEMBL12130476 | 0.84 | HMGCR (0.35) | HMGCR | |
| SCHEMBL13294442 | 0.83 | HMGCR (0.35) | HMGCR | |
| SCHEMBL14984019 | 0.83 | FABP7 (0.33) | FABP7 | |
| SCHEMBL14208684 | 0.82 | HMGCR (0.30) | HMGCR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170166664-A1 | METHOD FOR MANUFACTURING POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-15 | — | — | US | disclosed |
| US-9405200-B2 | Resist composition and method of forming resist pattern | TOYKO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9091915-B2 | Resist composition, method of forming resist pattern, polymeric compound and method of producing polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20150147702-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20130084523-A1 | RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-7638260-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20080124653-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-05-29 | — | — | US | disclosed |