SCHEMBL1360062

SCHEMBL1360062

CCCC(=O)CC(=O)[O-].CCCC(=O)CC(=O)[O-].CCO[Zr+2]OCC

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 3/20 0.43
HDAC1 Q13547 3/20 0.43
HDAC2 Q92769 3/20 0.43
HDAC8 Q9BY41 3/20 0.43
FFAR3 O14843 2/20 0.43
CES2 O00748 1/20 0.36
CES1 P23141 1/20 0.36
CA1 P00915 1/20 0.34
CA4 P22748 2/20 0.33
HAO1 Q9UJM8 1/20 0.32
ALDH1A1 P00352 1/20 0.32
CA2 P00918 2/20 0.32
HDAC6 Q9UBN7 1/20 0.31
NFKB1 P19838 2/20 0.31
CYP3A4 P08684 1/20 0.30
TSHR P16473 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30
CTSD P07339 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17106148 0.87 HDAC3 (0.41) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21066822 0.84 CA4 (0.36) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL453162 0.84 CA1 (0.39) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL1362060 0.82 HDAC3 (0.44) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL29408744 0.82 CA1 (0.38) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL1360823 0.82 FFAR3 (0.38) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL1361919 0.82 HDAC3 (0.48) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219182 0.81 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219178 0.81 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21236946 0.81 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3514822-B1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES (JP) 2023-04-26 EP disclosed
CN-113227281-B Film-forming composition 日产化学株式会社 2023-03-10 CN disclosed
US-11094899-B2 Method for manufacturing field effect transistor and method for manufacturing wireless communication device TORAY INDUSTRIES, INC. 2021-08-17 US disclosed
EP-3514822-A1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE Toray Industries, Inc. (JP) 2019-07-24 EP disclosed
US-20190198786-A1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES, INC. (JP) 2019-06-27 US disclosed
US-8450411-B2 Curable composition having a silane-modified reactive thinner HENKEL AG & CO. KGAA (DE) 2013-05-28 US disclosed
US-20120108730-A1 CURABLE COMPOSITION HAVING A SILANE-MODIFIED REACTIVE THINNER HENKEL AG & CO. KGAA (DE) 2012-05-03 US disclosed
US-8067508-B2 Compositions consisting of partially silyl-terminated polymers HENKEL AG & CO. KGAA (DE) 2011-11-29 US disclosed
US-20100081757-A1 COMPOSITIONS CONSISTING OF PARTIALLY SILYL-TERMINATED POLYMERS HENKEL AG & CO. KGAA (DE) 2010-04-01 US disclosed