Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 2/20 | 0.77 |
| ▸ | RAB9A | P51151 | 2/20 | 0.77 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.77 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.72 |
| ▸ | PGR | P06401 | 2/20 | 0.70 |
| ▸ | MEN1 | O00255 | 4/20 | 0.68 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.68 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.68 |
| ▸ | KCNK3 | O14649 | 2/20 | 0.68 |
| ▸ | KCNK9 | Q9NPC2 | 2/20 | 0.68 |
| ▸ | FABP1 | P07148 | 1/20 | 0.66 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.66 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.65 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.65 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.65 |
| ▸ | POLB | P06746 | 1/20 | 0.62 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.62 |
| ▸ | CASP3 | P42574 | 1/20 | 0.61 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.61 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.61 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7152809 | 0.98 | FFAR1 (0.75) | NPC1RAB9ASMN1; SMN2FFAR1PGR | |
| SCHEMBL8737301 | 0.90 | FFAR1 (0.69) | NPC1RAB9ASMN1; SMN2FFAR1PGR | |
| SCHEMBL22543145 | 0.88 | NR1H4 (0.78) | NPC1RAB9AFFAR1PGRMEN1 | |
| SCHEMBL9240473 | 0.88 | PGR (0.84) | NPC1RAB9ASMN1; SMN2FFAR1PGR | |
| SCHEMBL94989 | 0.88 | PGR (0.68) | NPC1RAB9ASMN1; SMN2FFAR1PGR | |
| SCHEMBL5226157 | 0.87 | NPC1 (1.00) | NPC1RAB9ASMN1; SMN2PGRMEN1 | |
| SCHEMBL27874895 | 0.87 | NPC1 (0.73) | NPC1RAB9ASMN1; SMN2FFAR1MEN1 | |
| SCHEMBL6629002 | 0.85 | NPC1 (0.70) | NPC1RAB9ASMN1; SMN2FFAR1PGR | |
| SCHEMBL29831035 | 0.85 | NPC1 (0.78) | NPC1RAB9ASMN1; SMN2MEN1KMT2A | |
| SCHEMBL8374911 | 0.85 | HDAC1 (0.85) | NPC1RAB9ASMN1; SMN2MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1744213-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC COMPONENT | HITACHI CHEM DUPONT MICROSYS (JP) | 2014-09-03 | — | — | EP | disclosed |
| US-7638254-B2 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD (JP) | 2009-12-29 | — | — | US | disclosed |
| US-7638254-B2 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090011364-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC PART | HATTORI TAKASHI | 2009-01-08 | — | — | US | disclosed |
| US-20090011364-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC PART | HATTORI TAKASHI | 2009-01-08 | — | — | US | disclosed |
| US-7435525-B2 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2008-10-14 | — | — | US | disclosed |
| US-7435525-B2 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2008-10-14 | — | — | US | disclosed |
| US-20070122733-A1 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20070122733-A1 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| EP-1744213-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC COMPONENT | Hitachi Chemical DuPont Microsystems Ltd. (JP) | 2007-01-17 | — | — | EP | disclosed |