Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 5/20 | 0.44 |
| ▸ | MAOA | P21397 | 4/20 | 0.44 |
| ▸ | LCK | P06239 | 1/20 | 0.43 |
| ▸ | CCNB2 | O95067 | 1/20 | 0.41 |
| ▸ | CDK1 | P06493 | 1/20 | 0.41 |
| ▸ | CDK4 | P11802 | 1/20 | 0.41 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.41 |
| ▸ | CCND1 | P24385 | 1/20 | 0.41 |
| ▸ | CCNB3 | Q8WWL7 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
| ▸ | TLR4 | O00206 | 1/20 | 0.39 |
| ▸ | TLR2 | O60603 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | G6PC1 | P35575 | 1/20 | 0.36 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1358841 | 0.85 | TDP1 (0.41) | MAOBMAOALCKCCNB2CDK1 | |
| SCHEMBL1397219 | 0.85 | LCK (0.48) | MAOBMAOALCKCCNB2CDK1 | |
| SCHEMBL6775509 | 0.84 | PPARG (0.42) | LCKALDH1A1CYP1A1CYP1A2CYP19A1 | |
| SCHEMBL27800964 | 0.83 | BCHE (0.39) | MAOBMAOAALDH1A1TDP1TP53 | |
| SCHEMBL1359770 | 0.82 | TP53 (0.41) | MAOBMAOAALDH1A1KDM4ETLR4 | |
| SCHEMBL1360519 | 0.81 | TP53 (0.40) | MAOBMAOAALDH1A1KDM4ETLR4 | |
| SCHEMBL1360538 | 0.79 | TP53 (0.38) | TDP1TP53 | |
| SCHEMBL1358902 | 0.78 | TLR4 (0.42) | TLR4TLR2TDP1TP53TSHR | |
| SCHEMBL2265668 | 0.77 | MAOB (0.71) | MAOBMAOALCKCCNB2CDK1 | |
| SCHEMBL1358728 | 0.77 | TP53 (0.44) | ALDH1A1TDP1TP53CYP1A1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107229185-B | Energy-sensitive composition, cured product, and method for producing cured product | 东京应化工业株式会社 | 2022-04-15 | — | — | CN | disclosed |
| CN-107207456-B | Latent acids and their use | 巴斯夫欧洲公司 | 2021-05-04 | — | — | CN | disclosed |
| EP-3253735-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2021-03-31 | — | — | EP | disclosed |
| EP-2539316-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2019-10-23 | — | — | EP | disclosed |
| US-9994538-B2 | Latent acids and their use | BASF SE (DE) | 2018-06-12 | — | — | US | disclosed |
| US-20180009775-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2018-01-11 | — | — | US | disclosed |
| WO-2016124493-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2016-08-11 | — | — | WO | disclosed |
| EP-2007834-B1 | SULPHONIUM SALT INITIATORS | BASF SE (DE) | 2015-11-04 | — | — | EP | disclosed |
| EP-1595182-B1 | HALOGENATED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS | BASF SE (DE) | 2015-09-30 | — | — | EP | disclosed |
| EP-1769286-B1 | OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS | BASF SE (DE) | 2015-09-09 | — | — | EP | disclosed |
| EP-0520642-B1 | Resist material and pattern formation process | WAKO PURE CHEM IND LTD (JP) | 1998-10-28 | — | — | EP | disclosed |
| US-5670299-A | COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-09-23 | — | — | US | disclosed |
| EP-0789279-A1 | Polymer and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0780732-A2 | Polymer composition and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-06-25 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| US-5468589-A | Heat resistant, photosensitive patterns | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1995-11-21 | — | — | US | disclosed |
| EP-0588544-A2 | Fine pattern forming material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1994-03-23 | — | — | EP | disclosed |
| EP-0520642-A1 | Resist material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1992-12-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180009775-A1 | LATENT ACIDS AND THEIR USE | LTA, C1S, C9 | MAOB 510/4885MAOA 434/4885LCK 4264/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.