SCHEMBL1358728

SCHEMBL1358728

C=Cc1cccc(OC(C)(C)OC)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
CHRM5 P08912 1/20 0.40
RELA Q04206 1/20 0.39
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38
MAPT P10636 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
NFE2L2 Q16236 3/20 0.37
CYP19A1 P11511 1/20 0.36
NQO2 P16083 1/20 0.36
TRPA1 O75762 1/20 0.35
TUBB4A P04350 1/20 0.35
TUBB P07437 1/20 0.35
TUBA3C P0DPH7 1/20 0.35
TUBA1B P68363 1/20 0.35
TUBA4A P68366 1/20 0.35
TUBB4B P68371 1/20 0.35
TUBB3 Q13509 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1359683 0.85 TP53 (0.43) TP53TDP1CHRM5RELACYP3A4
SCHEMBL408218 0.84 TP53 (0.48) TP53TDP1CHRM5RELACYP3A4
SCHEMBL30988604 0.84 TP53 (0.48) TP53TDP1CHRM5RELACYP3A4
SCHEMBL3708355 0.82 TP53 (0.47) TP53TDP1CHRM5RELACYP3A4
SCHEMBL1359770 0.82 TP53 (0.41) TP53TDP1CHRM5RELACYP3A4
SCHEMBL1360569 0.82 TP53 (0.41) TP53TDP1CHRM5RELACYP3A4
SCHEMBL1359805 0.82 TP53 (0.41) TP53TDP1CHRM5RELACYP3A4
SCHEMBL1358879 0.81 RELA (0.45) TP53CHRM5RELACYP3A4NFE2L2
SCHEMBL29602276 0.81 RELA (0.45) TP53CHRM5RELACYP3A4NFE2L2
SCHEMBL1360853 0.81 TDP1 (0.40) TP53TDP1CHRM5RELACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0588544-A2 Fine pattern forming material and pattern formation process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1994-03-23 EP claimed
CN-107229185-B Energy-sensitive composition, cured product, and method for producing cured product 东京应化工业株式会社 2022-04-15 CN disclosed
CN-107207456-B Latent acids and their use 巴斯夫欧洲公司 2021-05-04 CN disclosed
EP-3253735-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2021-03-31 EP disclosed
EP-2539316-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2019-10-23 EP disclosed
US-9994538-B2 Latent acids and their use BASF SE (DE) 2018-06-12 US disclosed
US-20180009775-A1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2018-01-11 US disclosed
WO-2016124493-A1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2016-08-11 WO disclosed
EP-2007834-B1 SULPHONIUM SALT INITIATORS BASF SE (DE) 2015-11-04 EP disclosed
EP-1595182-B1 HALOGENATED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS BASF SE (DE) 2015-09-30 EP disclosed
EP-0520642-B1 Resist material and pattern formation process WAKO PURE CHEM IND LTD (JP) 1998-10-28 EP disclosed
US-5670299-A COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1997-09-23 US disclosed
EP-0789279-A1 Polymer and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-08-13 EP disclosed
EP-0780732-A2 Polymer composition and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-06-25 EP disclosed
US-5558971-A HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1996-09-24 US disclosed
US-5558976-A HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1996-09-24 US disclosed
EP-0704762-A1 Resist material and pattern formation WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1996-04-03 EP disclosed
US-5468589-A Heat resistant, photosensitive patterns WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1995-11-21 US disclosed
EP-0588544-A2 Fine pattern forming material and pattern formation process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1994-03-23 EP disclosed
EP-0520642-A1 Resist material and pattern formation process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1992-12-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180009775-A1 LATENT ACIDS AND THEIR USE LTA, C1S, C9 TP53 1514/4885TDP1 3849/4885CHRM5 345/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.