Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL107043 | 0.87 | NAAA (0.38) | NAAATSHRNPSR1CYP17A1CYP19A1 | |
| SCHEMBL19261124 | 0.85 | NAAA (0.36) | NAAATSHRNPSR1CYP17A1CYP19A1 | |
| SCHEMBL13817685 | 0.85 | NAAA (0.40) | NAAATSHRNPSR1CYP17A1CYP19A1 | |
| SCHEMBL12628479 | 0.80 | CYP19A1 (0.43) | NAAANPSR1CYP17A1CYP19A1 | |
| SCHEMBL25515592 | 0.80 | NAAA (0.36) | NAAATSHRNPSR1CYP17A1CYP19A1 | |
| SCHEMBL10186544 | 0.80 | TSHR (0.45) | NAAATSHRNPSR1CYP17A1CYP19A1 | |
| SCHEMBL13609146 | 0.80 | TSHR (0.38) | NAAATSHRNPSR1CYP19A1 | |
| SCHEMBL12287632 | 0.80 | TSHR (0.47) | NAAATSHRNPSR1CYP17A1CYP19A1 | |
| SCHEMBL25521627 | 0.78 | TSHR (0.34) | NAAATSHRNPSR1 | |
| SCHEMBL15745514 | 0.78 | NAAA (0.30) | NAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10018913-B2 | Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-20170115569-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20090274975-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |