Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | NFE2L2 | Q16236 | 3/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 3/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30415589 | 1.00 | ALDH1A1 (0.40) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL1458922 | 0.82 | NFE2L2 (0.38) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL16536268 | 0.82 | ALDH1A1 (0.36) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL16537793 | 0.82 | ALDH1A1 (0.36) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL7137350 | 0.81 | KMT2A (0.36) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL7133853 | 0.81 | ALDH1A1 (0.35) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL9412802 | 0.81 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL7132215 | 0.81 | ALDH1A1 (0.35) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL7135818 | 0.81 | ALDH1A1 (0.35) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 | |
| SCHEMBL1899988 | 0.81 | ALDH1A1 (0.35) | ALDH1A1KMT2AMEN1CYP3A4NFE2L2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 165 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2005108473-A1 | SEMICONDUCTOR NANOPARTICLE-ENCAPSULATING VINYL POLYMER, VINYL POLYMER MIXTURE INCLUDINGTHE SAME, AND PROCESS OF PREPARING THE SAME | SEOUL NATIONAL UNIVERSITY INDUSTRY FOUNDATION (KR) | 2005-11-17 | — | — | WO | claimed |
| US-5914219-A | Radiation-sensitive mixture and the production of relief structures having improved contrast | BASF AKTIENGESELLSCHAFT (DE) | 1999-06-22 | — | — | US | claimed |
| EP-0616258-B1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF AG (DE) | 1997-05-21 | — | — | EP | claimed |
| EP-0605856-B1 | Process for the manufacture of p-hydroxystyrene polymers and use thereof | BASF AG (DE) | 1996-08-28 | — | — | EP | claimed |
| WO-2024020780-A1 | STAR-SHAPED POLYMER, PAINT, COATING, AND METHOD FOR PRODUCING STAR-SHAPED POLYMER | DIC CORPORATION (JP) | 2024-02-01 | — | — | WO | disclosed |
| CN-115997158-A | Ophthalmic lens | 株式会社目立康 | 2023-04-21 | — | — | CN | disclosed |
| WO-2022236548-A1 | STAR POLYMER, COATING MATERIAL, COATING FILM, AND METHOD FOR PRODUCING STAR POLYMER | DIC CORPORATION (JP) | 2022-11-17 | — | — | WO | disclosed |
| CN-107229185-B | Energy-sensitive composition, cured product, and method for producing cured product | 东京应化工业株式会社 | 2022-04-15 | — | — | CN | disclosed |
| CN-114051497-A | Chromene compound and photochromic optical article | 株式会社德山 | 2022-02-15 | — | — | CN | disclosed |
| WO-2021149763-A1 | CURABLE COMPOSITION FOR PRODUCTION OF RESIN SHEET | 東亞合成株式会社 | 2021-07-29 | — | — | WO | disclosed |
| CN-113039075-A | Rubber composition, vulcanized rubber, and tire | 株式会社普利司通 | 2021-06-25 | — | — | CN | disclosed |
| CN-112839989-A | Rubber composition, tread rubber, and tire | 株式会社普利司通 | 2021-05-25 | — | — | CN | disclosed |
| WO-1995021817-A1 | SUBSTITUTED SPIRO COMPOUNDS FOR THE TREATMENT OF INFLAMMATION | G.D. SEARLE & CO. (US) | 1995-08-17 | — | — | WO | disclosed |
| US-5378585-A | Photosensitivity for light sensitive elements | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1995-01-03 | — | — | US | disclosed |
| US-5352564-A | Copolymer of styrene derivatives, an acid release agent and a dissolution inhibitor containing an unstable acid group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1994-10-04 | — | — | US | disclosed |
| US-5290666-A | Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt | HITACHI, LTD. (JP) | 1994-03-01 | — | — | US | disclosed |
| EP-0464614-A2 | A composition having sensitivity to light or radiation | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1992-01-08 | — | — | EP | disclosed |
| US-5073474-A | Organic compound containing acid cleavable group(s) which also forms strong acid on irradiation, positive-working | BASF AKTIENGESELLSCHAFT (DE) | 1991-12-17 | — | — | US | disclosed |
| EP-0353600-A2 | Aromatic diazonium salt, radiation sensitive composition containing the aromatic diazonium salt and method for formation of pattern using the radiation sensitive composition | HITACHI, LTD. (JP) | 1990-02-07 | — | — | EP | disclosed |
| US-4808682-A | BLEND WITH OLEFINICALLY UNSATURATED SILICON COMPOUND | BASF AKTIENGESELLSCHAFT (DE) | 1989-02-28 | — | — | US | disclosed |