SCHEMBL13613989

SCHEMBL13613989

CCC(C)(C)C(=O)OCOCC1(C)CCCC1

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL47412 0.98 HMGCR (0.30) HMGCR
SCHEMBL18897999 0.84
SCHEMBL13932781 0.76 HMGCR (0.32) HMGCR
SCHEMBL25948963 0.75 HMGCR (0.31) HMGCR
SCHEMBL14616287 0.74 BCHE (0.34)
SCHEMBL92362 0.74 CYP4F2 (0.40) HMGCR
SCHEMBL13302408 0.74 CYP4F2 (0.36) HMGCR
SCHEMBL47525 0.74 CYP17A1 (0.30)
SCHEMBL13330726 0.74 ALDH1A1 (0.33) HMGCR
SCHEMBL18253355 0.73 HMGCR (0.36) HMGCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8795942-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-05 US disclosed
US-7611821-B2 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-03 US disclosed
US-20080153030-A1 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-26 US disclosed
US-20080008961-A1 POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-01-10 US disclosed