Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | HMGCR | P04035 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL47423 | 0.86 | ALDH1A1 (0.47) | ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL13614022 | 0.77 | HMGCR (0.32) | HMGCR | |
| SCHEMBL13330729 | 0.76 | ALDH1A1 (0.33) | ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL15275707 | 0.76 | — | — | |
| SCHEMBL47430 | 0.74 | — | — | |
| SCHEMBL13613989 | 0.74 | HMGCR (0.31) | HMGCR | |
| SCHEMBL10189214 | 0.73 | ALDH1A1 (0.55) | ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL13360916 | 0.73 | — | — | |
| SCHEMBL47412 | 0.72 | HMGCR (0.30) | HMGCR | |
| SCHEMBL18898003 | 0.72 | ALDH1A1 (0.44) | ALDH1A1MEN1KMT2AL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8795942-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-20100124718-A1 | POLYMERIC COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESITS PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-20 | — | — | US | disclosed |
| US-7611821-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-03 | — | — | US | disclosed |
| US-20080153030-A1 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-26 | — | — | US | disclosed |
| US-20080008961-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-10 | — | — | US | disclosed |