Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 1/20 | 0.33 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.33 |
| ▸ | HMGCR | P04035 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16590959 | 0.82 | CYP4F2 (0.34) | CYP4F2CYP4A11HMGCR | |
| SCHEMBL5021627 | 0.81 | CYP4F2 (0.41) | CYP4F2CYP4A11HMGCR | |
| SCHEMBL802175 | 0.79 | CYP4F2 (0.33) | CYP4F2CYP4A11HMGCR | |
| SCHEMBL12732382 | 0.78 | HMGCR (0.33) | CYP4F2CYP4A11HMGCR | |
| SCHEMBL47526 | 0.75 | CYP4F2 (0.37) | CYP4F2CYP4A11HMGCR | |
| SCHEMBL16273460 | 0.75 | CTSK (0.31) | — | |
| SCHEMBL92362 | 0.74 | CYP4F2 (0.40) | CYP4F2CYP4A11HMGCR | |
| SCHEMBL16591023 | 0.74 | CYP4F2 (0.36) | CYP4F2CYP4A11HMGCR | |
| SCHEMBL2625589 | 0.74 | ALDH1A1 (0.42) | CYP4F2CYP4A11HMGCR | |
| SCHEMBL13302408 | 0.74 | CYP4F2 (0.36) | CYP4F2CYP4A11HMGCR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8795942-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-7611821-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-03 | — | — | US | disclosed |
| US-20080153030-A1 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-26 | — | — | US | disclosed |
| US-20080008961-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-10 | — | — | US | disclosed |