Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13614017 | 0.85 | GPR84 (0.34) | GPR84CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL13614014 | 0.84 | GPR84 (0.34) | GPR84CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL13614010 | 0.82 | — | — | |
| SCHEMBL13614016 | 0.82 | GPR84 (0.34) | GPR84CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL13614018 | 0.81 | GPR84 (0.35) | GPR84CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL13614026 | 0.80 | GPR84 (0.32) | GPR84CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL13614024 | 0.79 | GPR84 (0.36) | GPR84CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL47433 | 0.79 | GPR84 (0.39) | GPR84CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL13614019 | 0.78 | GPR84 (0.38) | GPR84CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL14787816 | 0.73 | CYP3A4 (0.48) | GPR84CYP3A4CYP2D6CYP2C9CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7611821-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-03 | — | — | US | disclosed |
| US-20080008961-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-10 | — | — | US | disclosed |