SCHEMBL136442

SCHEMBL136442

CC(C)(C)OC(=O)NC1C2CC3CC(C2)CC1C3

nearest known ligand 0.58

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 3/20 0.56
HSD11B1 P28845 4/20 0.50
CYP2C9 P11712 1/20 0.50
EPHX1 P07099 1/20 0.49
L3MBTL1 Q9Y468 2/20 0.47
HSD17B10 Q99714 1/20 0.47
BTK Q06187 1/20 0.45
MEN1 O00255 1/20 0.44
MAPK1 P28482 1/20 0.44
KMT2A Q03164 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14657161 0.90 BTK (0.49) EPHX2HSD11B1CYP2C9BTKMEN1
SCHEMBL14935729 0.87 MEN1 (0.58) EPHX2HSD11B1CYP2C9EPHX1MEN1
SCHEMBL6338618 0.84 EPHX2 (0.51) EPHX2HSD11B1CYP2C9EPHX1L3MBTL1
SCHEMBL1849961 0.83 EPHX2 (0.50) EPHX2HSD11B1EPHX1L3MBTL1HSD17B10
SCHEMBL28785754 0.82 HSD11B1 (0.50) EPHX2HSD11B1CYP2C9EPHX1L3MBTL1
SCHEMBL1036010 0.82 HSD11B1 (0.58) EPHX2HSD11B1CYP2C9BTK
SCHEMBL2169364 0.82 MEN1 (0.49) EPHX2HSD11B1CYP2C9EPHX1L3MBTL1
SCHEMBL12499939 0.80 L3MBTL1 (0.51) EPHX2HSD11B1EPHX1L3MBTL1HSD17B10
SCHEMBL13698839 0.80 MEN1 (0.44) EPHX2HSD11B1CYP2C9BTKMEN1
SCHEMBL943516 0.80 HSD11B1 (0.56) EPHX2HSD11B1MEN1MAPK1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 213 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12306538-B2 Treatment liquid and pattern forming method FUJIFILM CORPORATION (JP) 2025-05-20 US disclosed
US-11681222-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2023-06-20 US disclosed
US-11453734-B2 Treatment liquid and pattern forming method FUJIFILM CORPORATION (JP) 2022-09-27 US disclosed
US-20220137508-A9 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2022-05-05 US disclosed
US-20210278764-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2021-09-09 US disclosed
US-20210200097-A1 TREATMENT LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2021-07-01 US disclosed
US-11042094-B2 Treatment liquid and pattern forming method FUJIFILM CORPORATION (JP) 2021-06-22 US disclosed
US-11036133-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2021-06-15 US disclosed
US-10962884-B2 Treatment liquid and pattern forming method FUJIFILM CORPORATION (JP) 2021-03-30 US disclosed
EP-2414896-B1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORP (JP) 2020-11-11 EP disclosed
EP-2128706-A1 RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN JSR Corporation (JP) 2009-12-02 EP disclosed
US-20090280433-A1 RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN JSR CORPORATION (JP) 2009-11-12 US disclosed
US-20090274977-A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2009-11-05 US disclosed
EP-2100870-A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION JSR Corporation (JP) 2009-09-16 EP disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed
EP-2060949-A1 RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN JSR Corporation (JP) 2009-05-20 EP disclosed
EP-2003148-A9 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2009-04-22 EP disclosed
CN-101395189-A Fluorine-containing polymer, method for purifying same, and radiation-sensitive resin composition JSR CORP (JP) 2009-03-25 CN disclosed
EP-2003148-A2 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-12-17 EP disclosed
EP-1953595-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090280433-A1 RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN ACP1, PLG, ALG1 EPHX2 722/4885HSD11B1 4462/4885CYP2C9 4591/4885
US-20090274977-A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION RAD51, SLC11A2, XRCC6 EPHX2 3619/4885HSD11B1 2514/4885CYP2C9 2852/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.