SCHEMBL13645141

SCHEMBL13645141

O=C(OCCC(O)(C(F)(F)F)C(F)(F)F)C1CC2C=CC1C2

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.44
RAB9A P51151 1/20 0.44
KMT2A Q03164 3/20 0.41
POLB P06746 3/20 0.40
HSD17B10 Q99714 2/20 0.40
APEX1 P27695 1/20 0.40
RECQL P46063 1/20 0.40
BLM P54132 1/20 0.40
ESR2 Q92731 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
HPGD P15428 1/20 0.40
LMNA P02545 2/20 0.40
KDM4E B2RXH2 2/20 0.40
MAPK1 P28482 2/20 0.34
MAPT P10636 1/20 0.34
MEN1 O00255 1/20 0.33
ALOX15 P16050 1/20 0.33
TSHR P16473 1/20 0.33
HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4167321 0.92 ALDH1A1 (0.42) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL4155837 0.90 ALDH1A1 (0.41) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL12198884 0.87 ALDH1A1 (0.46) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL14410083 0.86 ALDH1A1 (0.45) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL950161 0.86 ALDH1A1 (0.45) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL168726 0.84 ALDH1A1 (0.42) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL12250700 0.83 ALDH1A1 (0.41) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL12198890 0.83 ALDH1A1 (0.41) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL29596442 0.83 ALDH1A1 (0.41) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL24142262 0.82 ALDH1A1 (0.43) ALDH1A1RAB9AKMT2APOLBHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7598016-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-06 US disclosed
US-7514204-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-04-07 US disclosed
US-20080241736-A1 Immersion lithography; copolymer containing ammonium salt of carboxylic acid and fluorine monomer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-10-02 US disclosed
US-20080096131-A1 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-24 US disclosed