SCHEMBL13656366

SCHEMBL13656366

C=CCC(O)(CC=C)c1ccccc1O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.43
TSHR P16473 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
MAPT P10636 3/20 0.39
HSP90AA1 P07900 2/20 0.38
ACHE P22303 3/20 0.38
HTT P42858 1/20 0.37
KDM4E B2RXH2 2/20 0.35
CA12 O43570 2/20 0.35
CA2 P00918 2/20 0.35
RAB9A P51151 2/20 0.35
NPC1 O15118 1/20 0.35
GMNN O75496 1/20 0.35
EGFR P00533 1/20 0.35
LMNA P02545 1/20 0.35
FYN P06241 1/20 0.35
POLB P06746 1/20 0.35
CA3 P07451 1/20 0.35
CYP3A4 P08684 1/20 0.35
MMP9 P14780 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11077724 0.85 ALDH1A1 (0.35) ALDH1A1TSHRTDP1MAPTHSP90AA1
SCHEMBL677566 0.82 ALDH1A1 (0.45) ALDH1A1TSHRTDP1MAPTHSP90AA1
SCHEMBL5690395 0.78 ALDH1A1 (0.42) ALDH1A1TSHRTDP1MAPTHSP90AA1
SCHEMBL11487730 0.78 ALDH1A1 (0.42) ALDH1A1TSHRTDP1MAPTHSP90AA1
SCHEMBL11437771 0.78 ALDH1A1 (0.52) ALDH1A1TSHRTDP1MAPTHSP90AA1
SCHEMBL12681582 0.78 MAPT (0.41) ALDH1A1TSHRMAPTHSP90AA1ACHE
SCHEMBL13439639 0.78 MAPT (0.45) ALDH1A1TSHRTDP1MAPTHSP90AA1
SCHEMBL28899369 0.77 GABRA1 (0.43) ALDH1A1TSHRMAPTHTTLMNA
SCHEMBL9286623 0.76 ALDH1A1 (0.47) ALDH1A1TSHRTDP1MAPTHSP90AA1
SCHEMBL13463042 0.76 GABRA1 (0.41) ALDH1A1TSHRMAPTHSP90AA1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7604918-B2 Photosensitive polymer and photoresist composition having the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-10-20 US disclosed
US-7604918-B2 Photosensitive polymer and photoresist composition having the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-10-20 US disclosed
US-20070172760-A1 Photosensitive polymer and photoresist composition having the same SAMSUNG ELECTRONICS CO. LTD 2007-07-26 US disclosed
US-20070172760-A1 Photosensitive polymer and photoresist composition having the same SAMSUNG ELECTRONICS CO. LTD 2007-07-26 US disclosed