SCHEMBL13660749

SCHEMBL13660749

CCOC1C(C=O)CC2CCCC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9218138 0.74 POLB (0.33)
SCHEMBL10447717 0.68 ALDH1A1 (0.32)
SCHEMBL6574271 0.66 ALDH1A1 (0.39)
SCHEMBL10447412 0.66 ALDH1A1 (0.31)
SCHEMBL9877756 0.65
SCHEMBL881096 0.65
SCHEMBL12810559 0.65 ALDH1A1 (0.33)
SCHEMBL10447415 0.64
SCHEMBL6572114 0.63
SCHEMBL6576261 0.62 ALDH1A1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7608381-B2 copolymer of an acrylate monomer containing a 20 membered cyclic group, an acrylate monomer of alpha-alkyl acrylate estre having a lactone containing monocyclic or polycyclic group, a lower alkylate ester having an aliphatic cyclic group containing non acid dissociable dissociation inhibiting group TOKYO OHKA KOGYO CO., LTD. (JP) 2009-10-27 US disclosed
US-20080096126-A1 Polymer Compound, Positive Resist Composition and Process for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2008-04-24 US disclosed