⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28337071 | 0.75 | — | — | |
| Trichloroacetic Acid SCHEMBL11570664 | 0.70 | ALDH1A1 (0.47) | — | |
| Trichloroacetic Acid SCHEMBL28169658 | 0.70 | ALDH1A1 (0.83) | — | |
| Trichloroacetic Acid SCHEMBL1331955 | 0.67 | — | — | |
| Trichloroacetic Acid SCHEMBL10493657 | 0.67 | TSHR (1.00) | — | |
| Trichloroacetic Acid SCHEMBL10745837 | 0.67 | — | — | |
| SCHEMBL206379 | 0.67 | — | — | |
| SCHEMBL16499888 | 0.67 | — | — | |
| Trichloroacetic Acid SCHEMBL38661501 | 0.67 | — | — | |
| SCHEMBL6282434 | 0.67 | ALDH1A1 (0.54) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 169 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| EP-1471387-B1 | Photosensitive composition and compound used thereof | FUJIFILM CORP (JP) | 2015-11-11 | — | — | EP | disclosed |
| US-9128370-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-09-08 | — | — | US | disclosed |
| EP-1403710-B1 | Polymerizable composition | FUJIFILM CORP (JP) | 2015-06-10 | — | — | EP | disclosed |
| US-9023584-B2 | Radiation-sensitive composition, and compound | JSR CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8889888-B2 | Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8771923-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| EP-2080774-B1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORP (JP) | 2014-01-15 | — | — | EP | disclosed |
| EP-0759909-A1 | HETEROCYCLYLAMINO- AND HETEROCYCLYLOXY-CYCLOALKYL DERIVATIVES, THEIR PREPARATION AND THEIR USE AS PESTICIDES AND FUNGICIDES | Hoechst Schering AgrEvo GmbH (DE) | 1997-03-05 | — | — | EP | disclosed |
| WO-1997002264-A1 | SUBSTITUTED 1,3-DIOXAN-5-YLAMINO HETEROCYCLIC COMPOUNDS, METHODS FOR PREPARING THEM AND THEIR USE AS PESTICIDES | HOECHST SCHERING AGREVO GMBH (DE) | 1997-01-23 | — | — | WO | disclosed |
| WO-1996030345-A1 | CYCLOHEXYLAMINO AND CYCLOHEXYLALKOXY NITROGEN HETEROCYCLES, METHODS OF PREPARING THEM AND THEIR USE AS PEST-CONTROL AGENTS AND FUNGICIDES | HOECHST SCHERING AGREVO GMBH (DE) | 1996-10-03 | — | — | WO | disclosed |
| EP-0724197-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-07-31 | — | — | EP | disclosed |
| WO-1996011913-A1 | SUBSTITUTED CYCLOALKYLAMINO AND CYCLOALKOXY HETEROCYCLES, PROCESS FOR PREPARING THE SAME AND THEIR USE AS PESTICIDES | HOECHST SCHERING AGREVO GMBH (DE) | 1996-04-25 | — | — | WO | disclosed |
| WO-1995031441-A1 | HETEROCYCLYLAMINO- AND HETEROCYCLYLOXY-CYCLOALKYL DERIVATIVES, THEIR PREPARATION AND THEIR USE AS PESTICIDES AND FUNGICIDES | HOECHST SCHERING AGREVO GMBH (DE) | 1995-11-23 | — | — | WO | disclosed |
| EP-0282895-B1 | 2-oxa-isocephem compounds, compositions containing same and processes for preparing same | OTSUKA PHARMA CO LTD (JP) | 1995-06-07 | — | — | EP | disclosed |
| US-5037976-A | Antimicrobial Agent | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1991-08-06 | — | — | US | disclosed |
| US-4898859-A | 2-Oxa-isocephem compounds and compositions containing same | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1990-02-06 | — | — | US | disclosed |
| EP-0282895-A2 | 2-oxa-isocephem compounds, compositions containing same and processes for preparing same | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1988-09-21 | — | — | EP | disclosed |