⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12057465 | 0.90 | MDM2 (0.33) | — | |
| SCHEMBL13411736 | 0.86 | GAA (0.37) | — | |
| SCHEMBL10380209 | 0.78 | ALDH1A1 (0.36) | — | |
| SCHEMBL13686683 | 0.78 | RAB9A (0.37) | — | |
| SCHEMBL10652900 | 0.75 | — | — | |
| SCHEMBL13715636 | 0.75 | MDM2 (0.63) | — | |
| SCHEMBL13715672 | 0.75 | SMN1; SMN2 (0.57) | — | |
| SCHEMBL13411723 | 0.74 | FLT4 (0.41) | — | |
| SCHEMBL13411724 | 0.74 | CDK2 (0.37) | — | |
| SCHEMBL13446579 | 0.74 | ABL1 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9202709-B2 | Polishing liquid for metal and polishing method using the same | FUJIFILM CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9202709-B2 | Polishing liquid for metal and polishing method using the same | FUJIFILM CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20090239380-A1 | POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-09-24 | — | — | US | disclosed |
| US-20090239380-A1 | POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-09-24 | — | — | US | disclosed |
| US-20090088361-A1 | CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090088361-A1 | CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |