SCHEMBL13713610

SCHEMBL13713610

CCC(C(F)(F)C(C)(CC)S(=O)(=O)N1CCCC1)S(=O)(=O)O

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13451001 0.99 HTT (0.32) HTT
SCHEMBL13713608 0.99 HTT (0.32) HTT
SCHEMBL13713644 0.99 HTT (0.32) HTT
SCHEMBL13713635 0.85
SCHEMBL13450871 0.84
SCHEMBL13713640 0.82 HTT (0.35) HTT
SCHEMBL19491802 0.79
SCHEMBL13713571 0.76
SCHEMBL13713561 0.74
SCHEMBL13713614 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592126-B2 Positive resist composition and pattern forming method using the resist composition FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed