Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | PDK1 | Q15118 | 2/20 | 0.32 |
| ▸ | PDK2 | Q15119 | 2/20 | 0.32 |
| ▸ | PDK3 | Q15120 | 2/20 | 0.32 |
| ▸ | PDK4 | Q16654 | 2/20 | 0.32 |
| ▸ | ABCC9 | O60706 | 2/20 | 0.32 |
| ▸ | ABCC8 | Q09428 | 2/20 | 0.32 |
| ▸ | KCNJ11 | Q14654 | 2/20 | 0.32 |
| ▸ | KCNJ8 | Q15842 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | CNR1 | P21554 | 4/20 | 0.31 |
| ▸ | CNR2 | P34972 | 4/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13713608 | 0.84 | HTT (0.32) | HTTCNR1CNR2 | |
| SCHEMBL13451001 | 0.84 | HTT (0.32) | HTTCNR1CNR2 | |
| SCHEMBL13713644 | 0.84 | HTT (0.32) | HTTCNR1CNR2 | |
| SCHEMBL12832587 | 0.83 | LMNA (0.34) | PDK1PDK2PDK3PDK4ABCC9 | |
| SCHEMBL13713610 | 0.82 | HTT (0.30) | HTT | |
| SCHEMBL13713620 | 0.81 | HTT (0.32) | HTTCNR1CNR2 | |
| SCHEMBL16317483 | 0.76 | LMNA (0.38) | HTTPDK1PDK2PDK3PDK4 | |
| SCHEMBL18594459 | 0.76 | HTT (0.38) | HTTGAALMNACNR1CNR2 | |
| SCHEMBL13713604 | 0.75 | HTT (0.33) | HTTPDK1PDK2PDK3PDK4 | |
| SCHEMBL16687718 | 0.74 | LMNA (0.35) | HTTABCC9ABCC8KCNJ11KCNJ8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592126-B2 | Positive resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |