⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13713638 | 0.98 | CA1 (0.31) | — | |
| SCHEMBL13713665 | 0.98 | CA1 (0.31) | — | |
| SCHEMBL13713602 | 0.98 | CA1 (0.31) | — | |
| SCHEMBL12833003 | 0.86 | KMT2A (0.33) | — | |
| SCHEMBL13713603 | 0.86 | SMN1; SMN2 (0.36) | — | |
| SCHEMBL12832743 | 0.86 | TP53 (0.32) | — | |
| SCHEMBL13713664 | 0.77 | MAPT (0.30) | — | |
| SCHEMBL12832622 | 0.76 | — | — | |
| SCHEMBL13713667 | 0.76 | — | — | |
| SCHEMBL13713668 | 0.75 | SMN1; SMN2 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592126-B2 | Positive resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |