Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 5/20 | 0.38 |
| ▸ | CA1 | P00915 | 5/20 | 0.38 |
| ▸ | CA2 | P00918 | 5/20 | 0.38 |
| ▸ | CA7 | P43166 | 5/20 | 0.38 |
| ▸ | CA13 | Q8N1Q1 | 5/20 | 0.38 |
| ▸ | CA9 | Q16790 | 3/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | CA3 | P07451 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.32 |
| ▸ | CA6 | P23280 | 1/20 | 0.32 |
| ▸ | CA5A | P35218 | 1/20 | 0.32 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.32 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13713660 | 0.99 | CA12 (0.37) | CA12CA1CA2CA7CA13 | |
| SCHEMBL13713659 | 0.91 | CA12 (0.37) | CA12CA1CA2CA7CA13 | |
| SCHEMBL13713661 | 0.91 | CA12 (0.38) | CA12CA1CA2CA7CA13 | |
| SCHEMBL13713630 | 0.80 | TP53 (0.36) | TP53 | |
| SCHEMBL13713624 | 0.79 | TP53 (0.35) | TP53 | |
| SCHEMBL10172873 | 0.78 | CA2 (0.53) | CA12CA1CA2CA7CA13 | |
| SCHEMBL2611770 | 0.78 | CA2 (0.53) | CA12CA1CA2CA7CA13 | |
| SCHEMBL12172747 | 0.78 | CA2 (0.53) | CA12CA1CA2CA7CA13 | |
| SCHEMBL12689958 | 0.78 | CA2 (0.53) | CA12CA1CA2CA7CA13 | |
| SCHEMBL16313656 | 0.78 | CA2 (0.53) | CA12CA1CA2CA7CA13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592126-B2 | Positive resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-7465528-B2 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2008-12-16 | — | — | US | disclosed |
| US-7341817-B2 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-03-11 | — | — | US | disclosed |