⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL624558 | 0.73 | — | — | |
| SCHEMBL129326 | 0.71 | — | — | |
| SCHEMBL28577555 | 0.71 | — | — | |
| SCHEMBL3675527 | 0.69 | — | — | |
| SCHEMBL3736283 | 0.69 | — | — | |
| SCHEMBL1230878 | 0.69 | — | — | |
| SCHEMBL6014660 | 0.69 | — | — | |
| SCHEMBL10865968 | 0.67 | TRPA1 (0.30) | — | |
| SCHEMBL3769249 | 0.67 | TRPA1 (0.30) | — | |
| SCHEMBL3677602 | 0.67 | TRPA1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| EP-3578162-B1 | HAIR TREATMENT METHOD | KAO CORP (JP) | 2024-06-26 | — | — | EP | disclosed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| US-20240069441-A1 | COMPOSITION FOR RESIST UNDERLYING FILM FORMATION | NISSAN CHEMICAL CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| CN-117460995-A | Composition for forming underlayer film of silicon-containing resist | 日产化学株式会社 | 2024-01-26 | — | — | CN | disclosed |
| WO-2024019064-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | 日産化学株式会社 | 2024-01-25 | — | — | WO | disclosed |
| WO-2024009993-A1 | METHOD OF MANUFACTURING LAMINATE AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT | 日産化学株式会社 | 2024-01-11 | — | — | WO | disclosed |
| CN-113811364-B | Hair treatment method | 花王株式会社 | 2023-09-05 | — | — | CN | disclosed |
| WO-2023136250-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2023-07-20 | — | — | WO | disclosed |
| US-6815445-B2 | FOR USE AS FLUORESCENCE DYES AND PROBES | Life Technologies Corporation | 2004-11-09 | — | — | US | disclosed |
| US-20030105111-A1 | Substituted diphenyloxazoles, the synthesis thereof, and the use thereof as fluorescence probes | 3-DIMENSIONAL PHARMACEUTICALS, INC. | 2003-06-05 | — | — | US | disclosed |
| US-5929283-A | HYDROXY AMINES; LOW IN IRRITATIVENESS TO THE SKIN AND HAIR AND EXCELLENT IN FOAMABILITY, AND CAN GIVE A PLEASANT FEELING TO THE USER'S SKIN | KAO CORPORATION (JP) | 1999-07-27 | — | — | US | disclosed |
| EP-0708079-B1 | 2-HYDROXYPROPANEDIAMINE DERIVATIVE AND DETERGENT COMPOSITION CONTAINING THE SAME | KAO CORP (JP) | 1999-04-14 | — | — | EP | disclosed |
| US-5801270-A | Amine derivative and detergent composition containing the same | KAO CORPORATION (JP) | 1998-09-01 | — | — | US | disclosed |
| EP-0740651-B1 | AMINE DERIVATIVE AND DETERGENT COMPOSITION CONTAINING THE SAME | KAO CORP (JP) | 1998-08-12 | — | — | EP | disclosed |
| US-5714457-A | LOW IN IRRITATIVENESS TO SKIN AND HAIR, EXCELLENT IN FOAMABILITY | KAO CORPORATION (JP) | 1998-02-03 | — | — | US | disclosed |
| EP-0740651-A1 | AMINE DERIVATIVE AND DETERGENT COMPOSITION CONTAINING THE SAME | Kao Corporation (JP) | 1996-11-06 | — | — | EP | disclosed |
| EP-0708079-A1 | 2-HYDROXYPROPANEDIAMINE DERIVATIVE AND DETERGENT COMPOSITION CONTAINING THE SAME | Kao Corporation (JP) | 1996-04-24 | — | — | EP | disclosed |
| WO-1995016664-A1 | AMINE DERIVATIVE AND DETERGENT COMPOSITION CONTAINING THE SAME | KAO CORPORATION (JP) | 1995-06-22 | — | — | WO | disclosed |