SCHEMBL13715731

SCHEMBL13715731

O=C(Nc1cnc2ccccc2n1)Nc1nnn[nH]1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 2/20 0.54
▸ HSP90AA1 P07900 1/20 0.54
▸ HSP90AB1 P08238 1/20 0.54
▸ MAP3K5 Q99683 2/20 0.47
▸ MAP3K7 O43318 1/20 0.47
▸ MAP3K6 O95382 1/20 0.47
▸ EGFR P00533 1/20 0.42
▸ RAB9A P51151 3/20 0.42
▸ NPC1 O15118 2/20 0.42
▸ ALDH1A1 P00352 3/20 0.40
▸ POLB P06746 1/20 0.40
▸ GAA P10253 1/20 0.40
▸ PDGFRB P09619 1/20 0.40
▸ PDGFRA P16234 1/20 0.40
▸ ATIC P31939 1/20 0.39
▸ SMN1; SMN2 Q16637 2/20 0.39
▸ KMT2A Q03164 2/20 0.39
▸ HPGD P15428 1/20 0.38
▸ ALOX15 P16050 1/20 0.38
▸ HSD17B10 Q99714 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13715720 0.80 SMN1; SMN2 (0.59) KDM4ERAB9ANPC1ALDH1A1GAA
SCHEMBL13715632 0.79 NPC1 (0.58) RAB9ANPC1GAASMN1; SMN2KMT2A
SCHEMBL29186499 0.75 KDM4E (0.68) KDM4EHSP90AA1HSP90AB1MAP3K5MAP3K7
SCHEMBL12057465 0.74 MDM2 (0.33) —
SCHEMBL13715672 0.74 SMN1; SMN2 (0.57) RAB9ANPC1SMN1; SMN2KMT2AALOX15
SCHEMBL13715831 0.73 KDM4E (0.51) KDM4ERAB9ANPC1POLBGAA
SCHEMBL13715594 0.73 GOT1 (0.40) MAP3K5RAB9ANPC1SMN1; SMN2PLK4
SCHEMBL6163285 0.73 MGAM (0.51) KDM4ERAB9ANPC1ALDH1A1SMN1; SMN2
SCHEMBL13715830 0.72 EPHX2 (0.46) RAB9ANPC1SMN1; SMN2PIM1CDK5
SCHEMBL13715842 0.71 NPC1 (0.30) RAB9ANPC1SMN1; SMN2PIM1PIM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
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