SCHEMBL13715831

SCHEMBL13715831

O=C(Nc1cnccn1)Nc1nnn[nH]1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 8/20 0.51
▸ RAB9A P51151 7/20 0.51
▸ NPC1 O15118 4/20 0.51
▸ KMT2A Q03164 3/20 0.51
▸ POLB P06746 4/20 0.48
▸ GAA P10253 1/20 0.47
▸ MAPT P10636 1/20 0.47
▸ MEN1 O00255 1/20 0.47
▸ CHEK1 O14757 2/20 0.46
▸ PRKD3 O94806 2/20 0.46
▸ MAP4K4 O95819 2/20 0.46
▸ PIM1 P11309 2/20 0.46
▸ CDK8 P49336 2/20 0.46
▸ CLK2 P49760 2/20 0.46
▸ GSK3A P49840 2/20 0.46
▸ GSK3B P49841 2/20 0.46
▸ LIMK1 P53667 2/20 0.46
▸ CDK5 Q00535 2/20 0.46
▸ DYRK1A Q13627 2/20 0.46
▸ CLK4 Q9HAZ1 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5381046 0.82 KDM4E (0.69) KDM4ERAB9ANPC1KMT2APOLB
SCHEMBL12057465 0.80 MDM2 (0.33) —
SCHEMBL11624742 0.79 KMT2A (0.50) KDM4ERAB9ANPC1KMT2AMAPT
SCHEMBL13715632 0.79 NPC1 (0.58) RAB9ANPC1KMT2AGAAMAPT
SCHEMBL1148266 0.78 NPC1 (0.32) RAB9ANPC1PIM1SMN1; SMN2PIM3
SCHEMBL13715830 0.78 EPHX2 (0.46) RAB9ANPC1PIM1CDK5SMN1; SMN2
SCHEMBL10625332 0.77 NPC1 (0.50) KDM4ERAB9ANPC1KMT2APOLB
SCHEMBL13715842 0.76 NPC1 (0.30) RAB9ANPC1PIM1SMN1; SMN2PIM3
SCHEMBL13715634 0.75 RAB9A (0.56) KDM4ERAB9ANPC1KMT2AMAPT
SCHEMBL13715731 0.73 KDM4E (0.54) KDM4ERAB9ANPC1KMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
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