SCHEMBL1373872

SCHEMBL1373872

CCCCCCOCCC(=O)N(C(C)C)C(C)C

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 2/20 0.46
HTT P42858 2/20 0.44
MEN1 O00255 1/20 0.44
THRB P10828 1/20 0.44
KMT2A Q03164 1/20 0.44
MAPT P10636 1/20 0.44
SPHK1 Q9NYA1 1/20 0.42
LMNA P02545 2/20 0.41
PLA2G2C Q5R387 2/20 0.40
USP2 O75604 1/20 0.40
NAAA Q02083 1/20 0.39
DGKA P23743 1/20 0.39
CES1 P23141 1/20 0.39
RECQL P46063 2/20 0.38
GLA P06280 1/20 0.38
HPGD P15428 1/20 0.38
TSHR P16473 1/20 0.38
MAPK1 P28482 1/20 0.38
EPHX2 P34913 1/20 0.38
BLM P54132 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1376546 0.98 CES2 (0.43) CES2HTTMEN1THRBKMT2A
SCHEMBL1374576 0.93 TSHR (0.42) CES2HTTMEN1THRBKMT2A
SCHEMBL1377037 0.85 HSD17B10 (0.39) MEN1KMT2ATSHREPHX2
SCHEMBL23646902 0.81 CES2 (0.50) CES2MEN1KMT2ALMNACES1
SCHEMBL11398429 0.81 CES2 (0.50) CES2MEN1KMT2ALMNACES1
SCHEMBL25834706 0.81 CES2 (0.50) CES2MEN1KMT2ALMNACES1
SCHEMBL23646889 0.81 CES2 (0.50) CES2MEN1KMT2ALMNACES1
SCHEMBL6557859 0.81 CES2 (0.50) CES2MEN1KMT2ALMNACES1
SCHEMBL29039174 0.81 CES2 (0.50) CES2MEN1KMT2ALMNACES1
SCHEMBL22734126 0.80 ALDH1A1 (0.57) CES2HTTMEN1THRBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8563495-B2 Resist remover composition and method for removing resist using same IDEMITSU KOSAN CO., LTD. (JP) 2013-10-22 US disclosed
US-20110287995-A1 RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING SAME IDEMITSU KOSAN CO., LTD. (JP) 2011-11-24 US disclosed