SCHEMBL13751677

SCHEMBL13751677

Oc1c2ccccc2c(O)c2cc(S)ccc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HDAC3 O15379 2/20 0.50
▸ HDAC4 P56524 2/20 0.50
▸ HDAC1 Q13547 2/20 0.50
▸ HDAC2 Q92769 2/20 0.50
▸ HDAC10 Q969S8 2/20 0.50
▸ HDAC6 Q9UBN7 2/20 0.50
▸ HDAC5 Q9UQL6 2/20 0.50
▸ HDAC7 Q8WUI4 1/20 0.50
▸ HDAC11 Q96DB2 1/20 0.50
▸ HDAC8 Q9BY41 1/20 0.50
▸ HDAC9 Q9UKV0 1/20 0.50
▸ PKM P14618 2/20 0.42
▸ HTT P42858 2/20 0.40
▸ LMNA P02545 1/20 0.40
▸ KDM4E B2RXH2 4/20 0.38
▸ MEN1 O00255 4/20 0.38
▸ MAPT P10636 4/20 0.38
▸ KMT2A Q03164 4/20 0.38
▸ ALDH1A1 P00352 2/20 0.38
▸ GAA P10253 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19791143 0.79 HPRT1 (0.44) HTTKDM4EALDH1A1THRBHPGD
SCHEMBL526630 0.76 IDO1 (0.56) HDAC3HDAC4HDAC1HDAC2HDAC10
SCHEMBL28872648 0.74 ALDH1A1 (0.50) HDAC3HDAC4HDAC1HDAC2HDAC10
SCHEMBL7206760 0.73 IDO1 (0.53) HDAC3HDAC4HDAC1HDAC2HDAC10
Water SCHEMBL28866381 0.73 KDM4E (0.60) HDAC3HDAC4HDAC1HDAC2HDAC10
SCHEMBL7206757 0.73 IDO1 (0.53) HDAC3HDAC4HDAC1HDAC2HDAC10
SCHEMBL28236573 0.73 IDO1 (0.53) HDAC3HDAC4HDAC1HDAC2HDAC10
SCHEMBL21751240 0.71 PKM (0.52) HDAC3HDAC4HDAC1HDAC2HDAC10
SCHEMBL29566170 0.71 MEN1 (0.46) HDAC3HDAC4HDAC1HDAC2HDAC10
SCHEMBL11054327 0.71 MEN1 (0.46) HDAC3HDAC4HDAC1HDAC2HDAC10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090197067-A1 Novel Positive Photosensitive Resin Compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2009-08-06 — — US disclosed
US-7407731-B2 of photosensitive polybenzoxazole (PBO) precursors, a mercapto compound of given formula such as 2-mercaptobenzoxazole to inhibit residue from forming, a photosensitive agent, a photoactive compound and solvent; electronics, relief images FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-08-05 — — US disclosed
US-7399572-B2 Pretreatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-07-15 — — US disclosed
US-7316883-B2 Heat-sensitive lithographic printing plate FUJILFILM CORPORATION, LTD. (JP) 2008-01-08 — — US disclosed
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