SCHEMBL13752174

SCHEMBL13752174

O=C(Oc1ccccc1)c1ccc(Nc2nc(Nc3ccc(C(=O)Oc4ccccc4)cc3)nc(Nc3ccc(C(=O)Oc4ccccc4)cc3)n2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 5/20 0.53
▸ KMT2A Q03164 5/20 0.53
▸ HPGD P15428 2/20 0.51
▸ KDM4E B2RXH2 1/20 0.51
▸ RXFP1 Q9HBX9 1/20 0.51
▸ ALDH1A1 P00352 4/20 0.51
▸ PIN1 Q13526 1/20 0.50
▸ MYC P01106 1/20 0.50
▸ MAX P61244 1/20 0.50
▸ PARP10 Q53GL7 1/20 0.50
▸ RHOA P61586 1/20 0.50
▸ HTT P42858 1/20 0.49
▸ PRSS1 P07477 1/20 0.49
▸ ACR P10323 1/20 0.49
▸ TMPRSS15 P98073 1/20 0.49
▸ THRB P10828 1/20 0.48
▸ RAB9A P51151 1/20 0.48
▸ MAPT P10636 5/20 0.48
▸ USP2 O75604 1/20 0.47
▸ SMN1; SMN2 Q16637 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16677960 0.84 KMT2A (0.51) MEN1KMT2AHPGDKDM4ERXFP1
SCHEMBL70034 0.80 PARP10 (0.70) MEN1KMT2AHPGDALDH1A1PARP10
SCHEMBL9012325 0.80 MAPT (0.55) MEN1KMT2AHPGDKDM4EALDH1A1
SCHEMBL27708693 0.80 KMT2A (0.68) MEN1KMT2AHPGDKDM4EALDH1A1
SCHEMBL9479858 0.80 KMT2A (0.68) MEN1KMT2AHPGDKDM4EALDH1A1
SCHEMBL13955904 0.79 MAPK8 (0.49) MEN1KMT2AHPGDKDM4ERXFP1
SCHEMBL8579348 0.79 KMT2A (0.54) MEN1KMT2AHPGDALDH1A1PARP10
SCHEMBL11513863 0.78 KMT2A (0.57) MEN1KMT2AHPGDKDM4EALDH1A1
SCHEMBL4569980 0.78 RHOA (0.72) MEN1KMT2AKDM4ERXFP1ALDH1A1
SCHEMBL13227847 0.78 KMT2A (0.78) MEN1KMT2AHPGDKDM4ERXFP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7576036-B2 Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material FUJIFILM CORPORATION (JP) 2009-08-18 — — US disclosed
US-7576036-B2 Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material FUJIFILM CORPORATION (JP) 2009-08-18 — — US disclosed
US-20070032381-A1 Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2007-02-08 — — US disclosed
US-20070032381-A1 Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2007-02-08 — — US disclosed
US-20070004594-A1 Heat-sensitive recording material and heat-sensitive recording method FUJI PHOTO FILM CO., LTD. 2007-01-04 — — US disclosed
US-20070004594-A1 Heat-sensitive recording material and heat-sensitive recording method FUJI PHOTO FILM CO., LTD. 2007-01-04 — — US disclosed
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