SCHEMBL13760076

SCHEMBL13760076

CCC(C)(C)CC(C)(C(=O)OCC(=O)OCC(F)(F)F)C(C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14331407 0.91 HTT (0.33) HTT
SCHEMBL10191367 0.90 FGFR1 (0.33)
SCHEMBL10285000 0.89 HTT (0.38) HTT
SCHEMBL25522975 0.88 HTT (0.35) HTT
SCHEMBL17055704 0.88 HTT (0.35) HTT
SCHEMBL15080720 0.88
SCHEMBL18924493 0.86 HTT (0.34) HTT
SCHEMBL14817216 0.84 HTT (0.35) HTT
SCHEMBL16572673 0.84 HTT (0.33) HTT
SCHEMBL15214647 0.81 HTT (0.31) HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846838-B2 Fluorine-containing block copolymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2014-09-30 US disclosed
US-8790868-B2 Method of forming resist pattern and negative tone-development resist composition TOKYO OHKA KOGYO CO., LTD. (JP) 2014-07-29 US disclosed
US-20130053518-A1 POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING POLYMERIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2013-02-28 US disclosed
EP-2088466-A1 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound Tokyo Ohka Kogyo Co., Ltd. (JP) 2009-08-12 EP disclosed