SCHEMBL18924493

SCHEMBL18924493

CC(C)(C)CC(C)(C(=O)OCC(=O)OCC(=O)OCC(F)(F)F)C(C)(C)C

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17055704 0.98 HTT (0.35) HTT
SCHEMBL2876132 0.87 HTT (0.41) HTT
SCHEMBL10225038 0.86 FGFR1 (0.32)
SCHEMBL13760076 0.86 HTT (0.33) HTT
SCHEMBL21653866 0.86 HTT (0.33) HTT
SCHEMBL25522975 0.86 HTT (0.35) HTT
SCHEMBL16572673 0.85 HTT (0.33) HTT
SCHEMBL19606957 0.84 HTT (0.36) HTT
SCHEMBL10225929 0.84
SCHEMBL18924589 0.83 HTT (0.33) HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161256-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-25 US disclosed
US-11327399-B2 Photoresist composition and process for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-05-10 US disclosed
US-10838300-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-11-17 US disclosed
US-20180065925-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-03-08 US disclosed
US-9671692-B2 Compound, resin and photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10838300-B2 Salt and photoresist composition containing the same C1S, C1R, CRY1 HTT 2581/4885
US-20180065925-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME C1S, C1R, CRY1 HTT 2581/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.