Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19457925 | 0.85 | HSD11B1 (0.36) | HSD11B1PKM | |
| SCHEMBL16374917 | 0.81 | PKM (0.39) | HSD11B1PKM | |
| SCHEMBL2264953 | 0.81 | PKM (0.39) | HSD11B1PKM | |
| SCHEMBL24114741 | 0.76 | HSD11B1 (0.32) | HSD11B1 | |
| SCHEMBL19796073 | 0.76 | HSD11B1 (0.32) | HSD11B1 | |
| Methyl Alcohol SCHEMBL19283353 | 0.75 | PKM (0.44) | PKM | |
| SCHEMBL8366021 | 0.75 | HSD11B1 (0.35) | HSD11B1 | |
| SCHEMBL2126658 | 0.74 | PKM (0.48) | PKM | |
| SCHEMBL1150449 | 0.74 | PKM (0.48) | PKM | |
| SCHEMBL23333268 | 0.74 | PKM (0.48) | PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9805943-B2 | Polymer for resist under layer film composition, resist under layer film composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-31 | — | — | US | disclosed |
| US-9805943-B2 | Polymer for resist under layer film composition, resist under layer film composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-31 | — | — | US | disclosed |
| EP-2080774-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR Corporation (JP) | 2009-07-22 | — | — | EP | disclosed |