⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3894280 | 0.78 | ALOX5AP (0.32) | — | |
| SCHEMBL900016 | 0.75 | ALOX5AP (0.39) | — | |
| SCHEMBL13779595 | 0.74 | ALOX5AP (0.30) | — | |
| SCHEMBL15223673 | 0.74 | HSD11B1 (0.34) | — | |
| SCHEMBL4449268 | 0.74 | GRIN2D (0.34) | — | |
| SCHEMBL13183149 | 0.72 | ALOX5AP (0.37) | — | |
| SCHEMBL13779856 | 0.72 | HSD17B3 (0.31) | — | |
| SCHEMBL32689077 | 0.72 | HSD11B1 (0.35) | — | |
| SCHEMBL6345473 | 0.71 | ALOX5AP (0.30) | — | |
| SCHEMBL13779596 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7556908-B2 | Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-07-07 | — | — | US | disclosed |
| US-7232642-B2 | Chemically amplified positive resist composition, a haloester derivative and a process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-06-19 | — | — | US | disclosed |