SCHEMBL13779595

SCHEMBL13779595

CCCC1(O)CC2CCC1C2

nearest known ligand 0.39

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALOX5AP P20292 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13779856 0.89 HSD17B3 (0.31)
SCHEMBL3894280 0.83 ALOX5AP (0.32) ALOX5AP
SCHEMBL13183149 0.82 ALOX5AP (0.37) ALOX5AP
SCHEMBL900016 0.77 ALOX5AP (0.39) ALOX5AP
SCHEMBL4449268 0.75 GRIN2D (0.34) ALOX5AP
SCHEMBL15223673 0.75 HSD11B1 (0.34) ALOX5AP
SCHEMBL13779594 0.74
SCHEMBL6345473 0.72 ALOX5AP (0.30) ALOX5AP
SCHEMBL10486297 0.71
SCHEMBL31333039 0.71 HSD11B1 (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7556908-B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-07 US disclosed
US-7232642-B2 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-06-19 US disclosed