SCHEMBL13823614

SCHEMBL13823614

CS(=O)(=O)Nc1cccc(C(=O)O)c1C(=O)O

nearest known ligand 0.57

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 3/20 0.57
▸ MCL1 Q07820 1/20 0.50
▸ MMP2 P08253 1/20 0.50
▸ ALDH1A1 P00352 6/20 0.49
▸ KDM4E B2RXH2 5/20 0.49
▸ HPGD P15428 4/20 0.49
▸ HSD17B10 Q99714 3/20 0.49
▸ NR3C1 P04150 1/20 0.48
▸ KEAP1 Q14145 2/20 0.47
▸ NFE2L2 Q16236 1/20 0.47
▸ CCR2 P41597 1/20 0.47
▸ TSHR P16473 1/20 0.47
▸ MEN1 O00255 2/20 0.45
▸ SMN1; SMN2 Q16637 2/20 0.44
▸ HTT P42858 1/20 0.44
▸ PBRM1 Q86U86 1/20 0.44
▸ PKM P14618 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5226243 0.86 KEAP1 (0.61) KMT2AMCL1MMP2ALDH1A1KDM4E
SCHEMBL27351487 0.84 PBRM1 (0.45) KMT2AMMP2ALDH1A1KDM4EHPGD
SCHEMBL220059 0.84 KMT2A (0.72) KMT2AMCL1ALDH1A1KDM4EHPGD
SCHEMBL27396813 0.83 KMT2A (0.57) KMT2AMCL1MMP2ALDH1A1KDM4E
SCHEMBL23141257 0.81 MMP2 (0.49) KMT2AMCL1MMP2ALDH1A1NR3C1
SCHEMBL20399271 0.81 KMT2A (0.55) KMT2AMCL1MMP2ALDH1A1KDM4E
SCHEMBL3529403 0.81 KMT2A (0.55) KMT2AMCL1MMP2ALDH1A1KDM4E
SCHEMBL1835415 0.79 KMT2A (0.66) KMT2AMCL1ALDH1A1KDM4EHPGD
SCHEMBL10744595 0.79 CA12 (0.61) KMT2AMMP2ALDH1A1KDM4EHPGD
SCHEMBL2026957 0.78 PBRM1 (0.49) KMT2AALDH1A1KDM4EHPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7547335-B2 Metal polishing composition and method of polishing using the same FUJIFILM CORPORATION (JP) 2009-06-16 — — US disclosed
US-20070287362-A1 POLISHING COMPOSITION AND METHOD OF POLISHING WITH THE SAME FUJIFILM CORPORATION 2007-12-13 — — US disclosed
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