SCHEMBL13840916

SCHEMBL13840916

O=C(OCCc1ccc(C(F)(F)F)cc1)C(F)(F)SOOO

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 1/20 0.39
HDAC8 Q9BY41 1/20 0.39
PPARA Q07869 4/20 0.39
PPARG P37231 2/20 0.39
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
TAAR1 Q96RJ0 1/20 0.38
PPARD Q03181 2/20 0.37
MAOB P27338 1/20 0.37
NAAA Q02083 1/20 0.37
FFAR1 O14842 1/20 0.36
SIRT2 Q8IXJ6 1/20 0.36
PDPK1 O15530 1/20 0.36
PTPN1 P18031 1/20 0.36
GSK3B P49841 1/20 0.36
PTGES O14684 1/20 0.35
ALOX5 P09917 1/20 0.35
PLAAT3 P53816 1/20 0.35
PLAAT5 Q96KN8 1/20 0.35
PLAAT2 Q9NWW9 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2603105 0.86 HCAR2 (0.43) CA1CA2MAOBALOX5
SCHEMBL13840904 0.80 CES1 (0.40) TAAR1FFAR1
SCHEMBL2603104 0.80 CYP1A2 (0.41) HDAC1HDAC8PPARAPPARGPPARD
SCHEMBL2603126 0.78 LMNA (0.50) FFAR1
SCHEMBL2602908 0.78 TDP1 (0.43) PPARAPPARGMAOBFFAR1ALOX5
SCHEMBL14009408 0.74 CES1 (0.45) CA1CA2MAOBALOX5
SCHEMBL12972124 0.74 TDP1 (0.49)
SCHEMBL13842671 0.73 CA1 (0.46) HDAC1HDAC8PPARAPPARGCA1
SCHEMBL24510476 0.73 MAOB (0.48) HDAC1HDAC8PPARATAAR1PPARD
SCHEMBL2364381 0.73 TAAR1 (0.52) HDAC1HDAC8PPARATAAR1PPARD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed